Method of making halogen doped optical element
US-2017362115-A1 · Dec 21, 2017 · US
US10427965B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10427965-B2 |
| Application number | US-201615013499-A |
| Country | US |
| Kind code | B2 |
| Filing date | Feb 2, 2016 |
| Priority date | Aug 2, 2013 |
| Publication date | Oct 1, 2019 |
| Grant date | Oct 1, 2019 |
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A method for loading a blank composed of fused silica with hydrogen, including loading the blank at a first temperature (T 1 ) and a first hydrogen partial pressure (p 1 ), and further loading the blank at a second temperature (T 2 ) which is different from the first temperature and at a second hydrogen partial pressure (p 2 ) which is different from the first hydrogen partial pressure. The first and second temperatures (T 1 , T 2 ) are lower than a limit temperature (T L ) at which a thermal formation of silane in the fused silica of the blank commences. Also disclosed are a lens element produced from such a blank and a projection lens that includes at least one such lens element.
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What is claimed is: 1. A method for loading a blank composed of fused silica with hydrogen, comprising: loading the blank at a first temperature (T 1 ) of less than 475° C. and a first hydrogen partial pressure (p 1 ), and further loading the blank at a second temperature (T 2 ) of less than 300° C. and at a second hydrogen partial pressure (p 2 ) which is different from the first hydrogen partial pressure, wherein the first temperature and the second temperatures (T 1 , T 2 ) are lower than a limit temperature (T L ) at which a thermal formation of silane in the fused silica of the blank commences, and wherein the loading and the further loading results in a silane content in all locations of the blank of less than 5×10 14 molecules/cm 3 . 2. The method according to claim 1 , wherein the further loading of the blank is at a higher hydrogen partial pressure (p 2 >p 1 ) than is the loading. 3. The method according to claim 1 , wherein the limit temperature (T L ) at which the thermal formation of the silane in the fused silica of the blank commences is determined prior to the loading. 4. The method according to claim 3 , wherein the limit temperature (T L ) is determined based on a change (dK/dF) in absorption coefficient (K) of the fused silica of the blank with respect to an energy density (F) during irradiation of the blank with pulsed laser radiation at a wavelength of 193 nm. 5. The method according to claim 1 , wherein the blank is further loaded at a temperature (T 2 ) of less than 400° C. 6. The method according to claim 1 , wherein the blank is loaded at a hydrogen partial pressure (p 1 ) of less than 20%. 7. The method according to claim 1 , wherein the blank is further loaded at a hydrogen partial pressure (p 2 ) of 50% or more. 8. A lens element composed of fused silica and providing a surface and a further surface configured to transmit radiation therethrough, wherein, at a distance (d 1 ) of 1 mm from the surface, the lens element has a hydrogen content ([H 2 ]) of at least 5×10 16 molecules/cm 3 , wherein, in an inner volume of the lens element, the hydrogen content ([H 2 ]) falls to a minimum value of 10% or less of the hydrogen content ([H 2 ]) at the surface, and wherein, at a distance (d 2 ) of 8 mm from the surface, the hydrogen content ([H 2 ]) falls to 50% or less of the hydrogen content ([H 2 ]) at the surface; and wherein at all locations in the volume of the lens element a silane content is less than 5×10 14 molecules/cm 3 . 9. The lens element according to claim 8 , wherein a silane content varies over a thickness (D) of the lens element by not more than 50%. 10. The lens element according to claim 8 , wherein, at a distance (d 2 ) of 8 mm from the surface, the hydrogen content ([H 2 ]) falls to 40% or less of the hydrogen content ([H 2 ]) at the surface. 11. The lens element according to claim 8 , wherein the hydrogen content ([H 2 ]) as far as a distance (d 3 ) of 25 mm from the surface falls to 10% or less of the hydrogen content ([H 2 ]) at the surface. 12. The lens element according to claim 8 , wherein the hydrogen content ([H 2 ]) rises in a thickness direction (z) of the lens element from the minimum value to the further surface for passage of radiation to not more than 30% of the hydrogen content ([H 2 ]) at the surface. 13. The lens element according to claim 8 , which has, during irradiation with pulsed laser radiation at a wavelength of 193 nm, a change dK/dF in absorption coefficient (K) with respect to an energy density (F) of less than 5×10 −4 cm×pulse/mJ. 14. The lens element according to claim 8 , which has an OH content of less than 200 ppm by weight. 15. The lens element according to claim 8 , which has a refractive index (n) of less than 1.560830 for radiation at a wavelength (λ B ) of 193.368 nm. 16. The lens element according to claim 8 , wherein a wavefront distortion resulting from compaction during an irradiation of the lens element with pulsed laser radiation at a wavelength of 193 nm rises no more than linearly with pulse number of the laser radiation. 17. The lens element according to claim 8 , which exhibits no formation of microchannels after receiving a dose of 200 billion pulses having a pulse duration of in each case 150 ns at an energy density of 0.5 mJ/cm 2 /pulse or at a dose of 3.5 billion pulses having a pulse duration of in each case 130 ns at an energy density of 6.5 mJ/cm 2 /pulse. 18. A projection lens, comprising at least one lens element according to claim 8 . 19. The projection lens according to claim 18 , wherein the lens element is a last lens element of the projection lens. 20. A lens element composed of fused silica and providing a surface and a further surface configured to transmit radiation therethrough, wherein at least at one location in an inner volume of the lens element a hydrogen content ([H 2 ]) is less than 2×10 15 molecules/cm 3 , wherein the hydrogen content ([H 2 ]) at the surface and at the further surface is between 1.5 times and 5 times the hydrogen content ([H 2 ]) at the at least one location, wherein a silane content at the surface and at the further surface of the lens element is between 1.1 times and 2.20 times the silane content at the at least one location; and wherein at all locations in the volume of the lens element a silane content is less than 5×10 14 molecules/cm 3 . 21. A lens element composed of fused silica, wherein a ratio between a maximum silane content and a minimum silane content in a volume of the lens element is lower than a square root of the ratio between a maximum hydrogen content ([H 2 ]) and a minimum hydrogen content ([H 2 ]) in the volume of the lens element and wherein at all locations in the volume of the lens element a silane content is less than 5×10 14 molecules/cm 3 .
for the production of quartz or fused silica articles (other processes specially adapted for the production of quartz or fused silica articles C03B20/00) · CPC title
for use with ultraviolet radiation · CPC title
containing molecular hydrogen · CPC title
made of crystals, e.g. rock-salt, semi-conductors (G02B1/08 takes precedence) · CPC title
Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties · CPC title
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