Glass Cloth and Method of Manufacture
US-2024140863-A1 · May 2, 2024 · US
with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)}
with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C03C3/06 |
| Official title | with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} |
| Display label | with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} |
| Total patents | 641 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 33 |
| 2016 | 54 |
| 2017 | 65 |
| 2018 | 64 |
| 2019 | 71 |
| 2020 | 66 |
| 2021 | 59 |
| 2022 | 55 |
| 2023 | 39 |
| 2024 | 77 |
| 2025 | 50 |
| 2026 | 8 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Blank of TiO2-SiO2 glass for a mirror substrate for use in EUV lithography and method for the production thereof
US-9522840-B2 · Dec 20, 2016 · US
Method for preparing synthetic quartz glass substrate
US-2016363856-A1 · Dec 15, 2016 · US
Optical fiber preform
US-9512033-B2 · Dec 6, 2016 · US
Ultralow expansion glass
US-9505649-B2 · Nov 29, 2016 · US
Mask blank substrate, substrate with multilayer reflection film, transmissive mask blank, reflective mask, and semiconductor device fabrication method
US-9494851-B2 · Nov 15, 2016 · US
Mirror blank for euv lithography without expansion under euv radiation
US-2016320715-A1 · Nov 3, 2016 · US
Low loss optical fibers with fluorine and chlorine codoped core regions
US-2016304392-A1 · Oct 20, 2016 · US
Titania-doped quartz glass and making method
US-2016306271-A1 · Oct 20, 2016 · US
Laser sintering system and method for forming high purity, low roughness silica glass
US-9422187-B1 · Aug 23, 2016 · US
Ultralow expansion titania-silica glass
US-2016236965-A1 · Aug 18, 2016 · US
Hydrogen-supported fluorination of soot bodies
US-9416044-B2 · Aug 16, 2016 · US
Optical fiber and optical fiber preform
US-2016214886-A1 · Jul 28, 2016 · US
Method for producing iron-doped silica glass
US-2016200620-A1 · Jul 14, 2016 · US
Method and apparatus for adding thermal energy to a glass melt
US-2016200618-A1 · Jul 14, 2016 · US
Optical fiber preform and method for manufacturing such optical fiber preform from a primary preform
US-2016185649-A1 · Jun 30, 2016 · US
Optical member and image pickup apparatus
US-2016178806-A1 · Jun 23, 2016 · US
Method of finishing pre-polished glass substrate surface
US-2016168020-A1 · Jun 16, 2016 · US
Method for producing a large quartz-glass tube
US-2016168005-A1 · Jun 16, 2016 · US
Doped ultra-low expansion glass and methods for making the same
US-2016168010-A1 · Jun 16, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C03C3/06?
- CPC C03C3/06 is the Cooperative Patent Classification code for “with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)}.”
- How many patents are filed under CPC C03C3/06 (with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)})?
- Our database includes 641 publications tagged with this CPC code.
- Is patent activity under CPC C03C3/06 growing?
- Publication counts under this code: 77 in 2024 vs 50 in 2025 (latest complete years).