Balanced resonator source for plasma processing
US-12580153-B2 · Mar 17, 2026 · US
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Chen Zhiying patents
Chen Zhiying is listed as an inventor on 52 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Zhiying |
| Total patents | 52 |
| First publication | Feb 12, 2015 |
| Latest publication | Mar 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method of sustaining plasma for plasma processing
US-2026066226-A1 · Mar 5, 2026 · US
System and method to measure ion properties in a plasma system
US-12555756-B2 · Feb 17, 2026 · US
Non-intrusive method for 2D/3D mapping plasma parameters
US-12487182-B2 · Dec 2, 2025 · US
System and method for plasma process
US-2025364211-A1 · Nov 27, 2025 · US
Grid-less ion energy detector
US-2025292994-A1 · Sep 18, 2025 · US
Grid-less ion angle detector
US-2025291076-A1 · Sep 18, 2025 · US
Plasma potential adjustment circuit
US-2025273429-A1 · Aug 28, 2025 · US
Sensor in chamber insert ring assembly
US-2025246418-A1 · Jul 31, 2025 · US
Balanced resonator source for plasma processing
US-2025232952-A1 · Jul 17, 2025 · US
Recent patents
Latest publications not already listed above.
Method and system for plasma process
US-2025226179-A1 · Jul 10, 2025 · US
Method and system for plasma process
US-2025226192-A1 · Jul 10, 2025 · US
System and method to measure ion properties in a plasma system
US-2025132138-A1 · Apr 24, 2025 · US
Non-Intrusive Method for 2D/3D Mapping Plasma Parameters
US-2024377331-A1 · Nov 14, 2024 · US
Tailored electron energy distribution function by new plasma source: hybrid electron beam and RF plasma
US-12014901-B2 · Jun 18, 2024 · US
Plasma processing with radio frequency (RF) source and bias signal waveforms
US-11942307-B2 · Mar 26, 2024 · US
Electric pressure systems for control of plasma properties and uniformity
US-11728135-B2 · Aug 15, 2023 · US
Local bit select with improved fast read before write suppression
US-11682452-B2 · Jun 20, 2023 · US
Plasma Processing with Radio Frequency (RF) Source and Bias Signal Waveforms
US-2023117812-A1 · Apr 20, 2023 · US
Local bit select with improved fast read before write suppression
US-2023086799-A1 · Mar 23, 2023 · US
Apparatuses and methods for plasma processing
US-11393662-B2 · Jul 19, 2022 · US
Ion angle detector
US-11264212-B1 · Mar 1, 2022 · US
Hybrid electron beam and RF plasma system for controlled content of radicals and ions
US-11205562-B2 · Dec 21, 2021 · US
Ruthenium hard mask process
US-11183398-B2 · Nov 23, 2021 · US
Plasma processing apparatuses having a dielectric injector
US-11152194-B2 · Oct 19, 2021 · US
Plasma processing apparatuses including multiple electron sources
US-11043362-B2 · Jun 22, 2021 · US
Systems and methods of control for plasma processing
US-10998169-B2 · May 4, 2021 · US
Plasma processing apparatuses including multiple electron sources
US-2021082668-A1 · Mar 18, 2021 · US
Apparatuses and methods for plasma processing
US-2020365369-A1 · Nov 19, 2020 · US
Apparatuses and methods for plasma processing
US-2020365372-A1 · Nov 19, 2020 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Tokyo Electron Ltd | 50 |
| Chen Zhiying | 2 |
| Chen Lee | 2 |
| Funk Merritt | 2 |
| IBM | 2 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| H10P72/0421 | 16 |
| H10P50/242 | 14 |
| H01J2237/3341 | 12 |
| H01J37/32146 | 11 |
| H01J37/32935 | 11 |