Method for improving consistency in mask pattern generation
US-12554915-B2 · Feb 17, 2026 · US
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Chen Been-Der patents
Chen Been-Der is listed as an inventor on 20 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Chen Been-Der |
| Total patents | 20 |
| First publication | Jan 20, 2015 |
| Latest publication | Feb 17, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Method for generating patterning device pattern at patch boundary
US-2026004045-A1 · Jan 1, 2026 · US
Method for generating patterning device pattern at patch boundary
US-12430490-B2 · Sep 30, 2025 · US
Lithographic pattern representation with curvilinear elements
US-2025189881-A1 · Jun 12, 2025 · US
Field of view selection for metrology associated with semiconductor manufacturing
US-2025147433-A1 · May 8, 2025 · US
Pattern selection systems and methods
US-2024370621-A1 · Nov 7, 2024 · US
A machine learning model using target pattern and reference layer pattern to determine optical proximity correction for mask
US-2024119582-A1 · Apr 11, 2024 · US
Method for generating patterning device pattern at patch boundary
US-2024095437-A1 · Mar 21, 2024 · US
Method for generating patterning device pattern at patch boundary
US-11797748-B2 · Oct 24, 2023 · US
Method for determining curvilinear patterns for patterning device
US-11734490-B2 · Aug 22, 2023 · US
Recent patents
Latest publications not already listed above.
Method for improving consistency in mask pattern generation
US-2023044490-A1 · Feb 9, 2023 · US
Method for generating patterning device pattern at patch boundary
US-2022100079-A1 · Mar 31, 2022 · US
Method for determining curvilinear patterns for patterning device
US-11232249-B2 · Jan 25, 2022 · US
Method and system for pattern configuration
US-11176307-B2 · Nov 16, 2021 · US
Methods for training machine learning model for computation lithography
US-2020380362-A1 · Dec 3, 2020 · US
Method and system for pattern configuration
US-2020193080-A1 · Jun 18, 2020 · US
Assist feature placement based on machine learning
US-2020050099-A1 · Feb 13, 2020 · US
Method and apparatus for cost function based simultaneous OPC and SBAR optimization
US-9619607-B2 · Apr 11, 2017 · US
Method and apparatus for model based flexible MRC
US-9418194-B2 · Aug 16, 2016 · US
Multivariable solver for optical proximity correction
US-8938699-B2 · Jan 20, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Asml Netherlands Bv | 20 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F1/36 | 17 |
| G03F7/70441 | 16 |
| G06F30/398 | 13 |
| G03F7/705 | 13 |
| G03F1/70 | 12 |