Remote-plasma electron-induced mask repair
US-2026050208-A1 · Feb 19, 2026 · US
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Budach Michael patents
Budach Michael is listed as an inventor on 51 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Budach Michael |
| Total patents | 51 |
| First publication | May 10, 2016 |
| Latest publication | Feb 19, 2026 |
Notable patents
Publications ranked by popularity score, then publication date.
Creating an electric field when processing a lithography object
US-2025391632-A1 · Dec 25, 2025 · US
Method, device and computer program for repairing a mask defect
US-12493238-B2 · Dec 9, 2025 · US
Method and device for correcting image errors when scanning a charged particle beam over a sample
US-2025174429-A1 · May 29, 2025 · US
Method for examining a blank of a microlithographic photomask
US-2025147412-A1 · May 8, 2025 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-12292680-B2 · May 6, 2025 · US
Method for processing a defect of a microlithographic photomask
US-2025138413-A1 · May 1, 2025 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-12164226-B2 · Dec 10, 2024 · US
Devices and methods for examining and/or processing an element for photolithography
US-12135540-B2 · Nov 5, 2024 · US
Methods and apparatuses for processing a lithographic object
US-2024310722-A1 · Sep 19, 2024 · US
Recent patents
Latest publications not already listed above.
Method and apparatus for determining optical properties of deposition materials used for lithographic masks
US-2024219844-A1 · Jul 4, 2024 · US
Mesh Integrity Check
US-2024085171-A1 · Mar 14, 2024 · US
Method and apparatus for particle beam-induced processing of a defect of a microlithographic photomask
US-2024069434-A1 · Feb 29, 2024 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-11874598-B2 · Jan 16, 2024 · US
Device and method for analyzing a defect of a photolithographic mask or of a wafer
US-11733186-B2 · Aug 22, 2023 · US
Apparatus for analyzing and/or processing a sample with a particle beam and method
US-2023238209-A1 · Jul 27, 2023 · US
Apparatus and method for determining a position of an element on a photolithographic mask
US-11650495-B2 · May 16, 2023 · US
Method for particle beam-induced processing of a defect of a microlithographic photomask
US-2023081844-A1 · Mar 16, 2023 · US
Apparatus and method for examining and/or processing a sample
US-11592461-B2 · Feb 28, 2023 · US
Apparatus and method for determining a position of an element on a photolithographic mask
US-2022334469-A1 · Oct 20, 2022 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022317564-A1 · Oct 6, 2022 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022317565-A1 · Oct 6, 2022 · US
Method, device and computer program for repairing a mask defect
US-2022308443-A1 · Sep 29, 2022 · US
Method and apparatuses for disposing of excess material of a photolithographic mask
US-2022299864-A1 · Sep 22, 2022 · US
Apparatus and method for determining a position of an element on a photolithographic mask
US-11385540-B2 · Jul 12, 2022 · US
Apparatus and method for examining and/or processing a sample
US-2022178965-A1 · Jun 9, 2022 · US
Apparatus and method for examining and/or processing a sample
US-11262378-B2 · Mar 1, 2022 · US
Apparatus and method for repairing a photolithographic mask
US-11256168-B2 · Feb 22, 2022 · US
Methods and devices for examining an electrically charged specimen surface
US-11170970-B2 · Nov 9, 2021 · US
Method and apparatus for analyzing a defective location of a photolithographic mask
US-11150552-B2 · Oct 19, 2021 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 51 |
Top CPC classifications
Most common classification codes across this inventor's patents.