Apparatus and method for repairing a photolithographic mask

Patent metadata

Field	Value
Publication number	US-11256168-B2
Application number	US-202016775719-A
Country	US
Kind code	B2
Filing date	Jan 29, 2020
Priority date	Feb 5, 2019
Publication date	Feb 22, 2022
Grant date	Feb 22, 2022

Abstract

The present application relates to an apparatus for processing a photolithographic mask, said apparatus comprising: (a) at least one time-varying particle beam, which is embodied for a local deposition reaction and/or a local etching reaction on the photolithographic mask; (b) at least one first means for providing at least one precursor gas, wherein the precursor gas is embodied to interact with the particle beam during the local deposition reaction and/or the local etching reaction; and (c) at least one second means, which reduces a mean angle of incidence (φ) between the time-varying particle beam and a surface of the photolithographic mask.

First claim

What is claimed is:

1. An apparatus for processing a photolithographic mask, the apparatus comprising:
a. at least one time-varying particle beam, which is embodied for a local deposition reaction and/or a local etching reaction on the photolithographic mask;
b. at least one first means for providing at least one precursor gas, wherein the precursor gas is embodied to interact with the particle beam during the local deposition reaction and/or the local etching reaction;
c. at least one second means, which reduces a mean angle of incidence (φ) between the time-varying particle beam and a surface of the photolithographic mask;
d. an evaluation unit embodied to determine at least one reduction in the mean angle of incidence (φ) of the particle beam on the photolithographic mask from analysed scan data;
e. a control device configured to control the at least one second means to reduce the mean angle of incidence (φ) between the time-varying particle beam and the surface of the photolithographic mask; and
f. the control device being further configured to control the time-varying particle beam to interact with the at least one precursor gas to carry out the local deposition reaction and/or the local etching reaction;
g. wherein the control device is configured to control the at least one second means to reduce the mean angle of incidence (φ) at each of a plurality of points on the surface of the photolithographic mask while using the time-varying particle beam to interact with the at least one precursor gas to carry out the local deposition reaction and/or the local etching reaction.

2. The apparatus of claim 1 , wherein the second means comprises at least one element from the group:
a tilt apparatus for tilting the photolithographic mask relative to the particle beam;
a pivot apparatus of a beam source for tilting the particle beam relative to the photolithographic mask; and
at least one deflection apparatus for particles of the particle beam, for reducing the mean angle of incidence (φ) of the particle beam on the photolithographic mask.

3. The apparatus of claim 2 , wherein the deflection apparatus comprises at least one element from the group: an electrical deflection system and a magnetic deflection system.

4. The apparatus of claim 2 , wherein the at least one deflection apparatus is part of the beam source of the particle beam.

5. The apparatus of claim 2 , wherein the at least one deflection apparatus is not part of the beam source of the particle beam.

6. The apparatus of claim 3 , wherein the electrical deflection system comprises at least one deflection plate pair.

7. The apparatus of claim 3 , wherein the magnetic deflection system comprises at least one coil arrangement.

8. The apparatus of claim 2 , wherein the tilt apparatus comprises a specimen stage for the photolithographic mask, said specimen stage being rotatable about at least two axes, and wherein the two axes lie in a plane of the photolithographic mask and are not parallel to one another.

9. The apparatus of claim 1 , wherein the second means reduces the mean angle of incidence between the time-varying particle beam and the surface of the photolithographic mask by >5°.

10. The apparatus of claim 1 , wherein the particle beam at the point of incidence on the photolithographic mask has a focal diameter of 0.1 nm to 1000 nm.

11. The apparatus of claim 1 , wherein the particle beam has an aperture angle of 0.1 mrad to 1000 mrad.

12. The apparatus of claim 1 , wherein the evaluation unit is embodied to analyze scan data of a site to be processed on the photolithographic mask.

13. The apparatus of claim 1 , wherein the control device is configured to control the at least one second means to make multiple adjustments at multiple local processing sites on the photolithographic mask to reduce the mean angle of incidence (φ) between the time-varying particle beam and the surface of each local processing site on the photolithographic mask while using the time-varying particle beam to interact with the precursor gas to carry out the local deposition reaction and/or the local etching reaction at the first local processing site.

14. The apparatus of claim 1 , wherein the at least one time-varying particle beam scans a local processing site to obtain the scan data.

15. An apparatus for processing a photolithographic mask, the apparatus comprising:
a particle beam source configured to generate at least one time-varying particle beam for a local deposition reaction and/or a local etching reaction on the photolithographic mask;
at least one precursor gas supply configured to provide at least one precursor gas to interact with the particle beam during the local deposition reaction and/or the local etching reaction, the at least one precursor gas supply comprising at least one container for containing the at least one precursor gas and at least one control valve to control a flow rate of the at least one precursor gas;
a mean angle of incidence adjustment module configured to adjust a mean angle of incidence (φ) between the time-varying particle beam and a surface of the photolithographic mask, in which the mean angle of incidence adjustment module comprises at least one of (i) a motor or actuator configured to tilt the photolithographic mask relative to the particle beam, (ii) a motor or actuator configured to pivot the particle beam source to tilt the particle beam relative to the photolithographic mask, or (iii) at least one deflection apparatus configured to deflect the particles of the particle beam;
an evaluation unit embodied to determine at least one reduction in the mean angle of incidence (φ) of the particle beam on the photolithographic mask from analysed scan data; and
a control device configured to control the mean angle of incidence adjustment module to reduce the mean angle of incidence (φ) between the time-varying particle beam and the surface of the photolithographic mask and the time-varying particle beam to interact with the at least one precursor gas to carry out the local deposition reaction and/or the local etching reaction.

16. The apparatus of claim 15 , wherein the evaluation unit is configured to analyze scan data of a site to be processed on the photolithographic mask.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Budach Michael
• Hoinkis Ottmar

Classifications

• H01J2237/31744

  introducing gas in vicinity of workpiece · CPC title

• H01J2237/31732

  Depositing thin layers on selected microareas · CPC title

• H01J2237/30472

  Controlling the beam · CPC title

• H01J37/1478

  Beam tilting means, i.e. for stereoscopy or for beam channelling · CPC title

• G03F1/86

  by charged particle beam [CPB] · CPC title