Apparatus and method for examining and/or processing a sample

Patent metadata

Field	Value
Publication number	US-11262378-B2
Application number	US-202017128498-A
Country	US
Kind code	B2
Filing date	Dec 21, 2020
Priority date	Jun 21, 2018
Publication date	Mar 1, 2022
Grant date	Mar 1, 2022

Abstract

The present invention relates to an apparatus for examining and/or processing a sample, said apparatus comprising: (a) a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and (b) a scanning probe microscope with a deflectable probe; (c) wherein a detection structure is attached to the deflectable probe.

First claim

What is claimed is:

1. An apparatus for examining and/or processing a sample, the apparatus comprising:
a. a scanning particle microscope for providing a beam of charged particles, which can be directed on a surface of the sample; and
b. a scanning probe microscope with a deflectable probe;
c. wherein a detection structure is attached to the deflectable probe,
d. wherein the apparatus is adapted to determine a deflection of the probe by positioning the charged particle beam on the detection structure.

2. The apparatus of claim 1 , wherein the scanning particle microscope is configured to carry out at least one element of the group of: carrying out a line scan of the beam of charged particles over the detection structure and scanning the beam of charged particles over the detection structure.

3. The apparatus of claim 1 , wherein the detection structure has a material composition that differs from the material composition of the deflectable probe.

4. The apparatus of claim 1 , wherein the detection structure has a cylindrical, conical, rod-shaped or n-gon structure, wherein n≥3.

5. The apparatus of claim 1 , wherein the detection structure comprises at least two separate, adjacent materials with different atomic numbers.

6. The apparatus of claim 1 , wherein the detection structure comprises a detection area, which is configured to optimize an emission of charged secondary electrons and/or backscattered electrons.

7. The apparatus of claim 1 , wherein the detection structure comprises at least one areal element and wherein a normal vector of the areal element is directed substantially parallel to the longitudinal axis of the deflectable probe.

8. The apparatus of claim 7 , wherein the detection structure comprises at least two areal elements, which are arranged along the longitudinal axis of the deflectable probe.

9. The apparatus of claim 1 , wherein the detection structure comprises at least one marking.

10. The apparatus of claim 1 , further comprising an optical light pointer system, wherein the detection structure comprises a reflection structure, which is configured to reflect optical radiation of the optical light pointer system, and wherein the reflection structure is arranged at an angle that differs from zero in relation to a front side of the deflectable probe.

11. The apparatus of claim 1 , wherein the probe has an opening, which is embodied in such a way that the beam of charged particles can be directed onto the sample through the opening.

12. The apparatus of claim 1 , wherein the probe has an electrically conductive embodiment for the purposes of shielding and/or compensating an electrostatic charge of the sample.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Baur Christof
• Budach Michael

Classifications

• G01Q20/00

  Monitoring the movement or position of the probe · CPC title

• G01Q30/02 Primary

  Non-SPM analysing devices, e.g. SEM [Scanning Electron Microscope], spectrometer or optical microscope · CPC title

• H01J37/28 Primary

  with scanning beams {(H01J37/268, H01J37/292, H01J37/2955 take precedence)} · CPC title

• H01J2237/2583

  using tunnel effects, e.g. STM, AFM · CPC title

• H01J2237/022

  Avoiding or removing foreign or contaminating particles, debris or deposits on sample or tube · CPC title