Optical element having a coating for influencing heating radiation and optical arrangement
US-12025818-B2 · Jul 2, 2024 · US
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Bittner Boris patents
Bittner Boris is listed as an inventor on 60 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Bittner Boris |
| Total patents | 60 |
| First publication | Apr 30, 2015 |
| Latest publication | Jul 2, 2024 |
Notable patents
Publications ranked by popularity score, then publication date.
Optical element having a coating for influencing heating radiation and optical arrangement
US-2021364677-A1 · Nov 25, 2021 · US
Optical element having a coating for influencing heating radiation and optical arrangement
US-11112543-B2 · Sep 7, 2021 · US
Imaging optical system for microlithography
US-10754132-B2 · Aug 25, 2020 · US
Optical element having a coating for influencing heating radiation and optical arrangement
US-2019377107-A1 · Dec 12, 2019 · US
Optical element and optical arrangement therewith
US-10474036-B2 · Nov 12, 2019 · US
Optical element having a coating for influencing heating radiation and optical arrangement
US-10401540-B2 · Sep 3, 2019 · US
Projection exposure apparatus with at least one manipulator
US-10303063-B2 · May 28, 2019 · US
Projection exposure apparatus with a highly flexible manipulator
US-10261425-B2 · Apr 16, 2019 · US
Lithographic projection objective
US-2019025709-A1 · Jan 24, 2019 · US
Recent patents
Latest publications not already listed above.
Wavefront correction element for use in an optical system
US-10151922-B2 · Dec 11, 2018 · US
Projection lens with wave front manipulator and related method and apparatus
US-10061206-B2 · Aug 28, 2018 · US
Projection exposure apparatus with optimized adjustment possibility
US-10054860-B2 · Aug 21, 2018 · US
Lithographic projection objective
US-10042265-B2 · Aug 7, 2018 · US
Method of operating a microlithographic projection apparatus
US-10018907-B2 · Jul 10, 2018 · US
Projection exposure apparatus with at least one manipulator
US-2018173100-A1 · Jun 21, 2018 · US
Projection lens for EUV microlithography, film element and method for producing a projection lens comprising a film element
US-10001631-B2 · Jun 19, 2018 · US
Projection exposure method and projection exposure apparatus for microlithography
US-2018136565-A1 · May 17, 2018 · US
Optical assembly
US-9939730-B2 · Apr 10, 2018 · US
Projection exposure apparatus with at least one manipulator
US-9927714-B2 · Mar 27, 2018 · US
Projection lens with wave front manipulator and related method and apparatus
US-2018081281-A1 · Mar 22, 2018 · US
Projection exposure apparatus including at least one mirror
US-9910364-B2 · Mar 6, 2018 · US
Wavefront correction element for use in an optical system
US-2018059413-A1 · Mar 1, 2018 · US
Projection exposure apparatus with at least one manipulator
US-9846367-B2 · Dec 19, 2017 · US
System correction from long timescales
US-9829800-B2 · Nov 28, 2017 · US
Projection exposure method and projection exposure apparatus for microlithography
US-9817316-B2 · Nov 14, 2017 · US
Projection Lens for EUV Microlithography, Film Element and Method for Producing a Projection Lens Comprising a Film Element
US-2017261730-A9 · Sep 14, 2017 · US
Projection exposure apparatus comprising a manipulator, and method for controlling a projection exposure apparatus
US-9760019-B2 · Sep 12, 2017 · US
Projection exposure apparatus with at least one manipulator
US-2017219932-A1 · Aug 3, 2017 · US
Mirror arrangement for an EUV projection exposure apparatus, method for operating the same, and EUV projection exposure apparatus
US-9709770-B2 · Jul 18, 2017 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Zeiss Carl Smt Gmbh | 60 |
| Bittner Boris | 2 |
| Walter Holger | 1 |
| Roesch Matthias | 1 |
| Wabra Norbert | 1 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70891 | 35 |
| G03F7/70258 | 27 |
| G03F7/70266 | 27 |
| G03F7/70191 | 18 |
| G21K1/062 | 18 |