Optical element having a coating for influencing heating radiation and optical arrangement

Patent metadata

Field	Value
Publication number	US-12025818-B2
Application number	US-202117393551-A
Country	US
Kind code	B2
Filing date	Aug 4, 2021
Priority date	Aug 19, 2014
Publication date	Jul 2, 2024
Grant date	Jul 2, 2024

Abstract

The disclosure relates to an optical element, including: a substrate, a first coating, which is disposed on a first side of the substrate and is configured for reflecting radiation having a used wavelength (λ EUV ) in the EUV wavelength range, and a second coating, which is disposed on a second side of the substrate, for influencing heating radiation that is incident on the second side of the substrate. The disclosure also relates to an optical arrangement having at least one such optical element.

First claim

What is claimed is:

1. An optical element, comprising:
a substrate having first and second sides;
a first coating supported by the first side of the substrate; and
a second coating supported by the second side of the substrate,
wherein:
the substrate comprises a glass;
the first coating reflects EUV radiation;
the second coating comprises:
an absorbing layer that absorbs radiation having a wavelength in a range selected from the group consisting of the visible range and the infrared range; and
an anti-reflecting layer that suppresses reflection of radiation at the wavelength,

the absorbing layer is between the substrate and the anti-reflection layer; and
the optical element is an EUV mirror.

2. The optical element of claim 1 , wherein a maximum absorbance of the absorbing layer is at wavelengths of more than 1500 nm.

3. The optical element of claim 1 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.

4. The optical element of claim 2 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.

5. The optical element of claim 1 , wherein the substrate comprises a material that is at least partially absorbent for radiation at the wavelength.

6. The optical element of claim 1 , wherein the glass comprises a silicate glass.

7. The optical element of claim 1 , wherein the glass comprises a quartz glass.

8. The optical element of claim 1 , wherein the glass comprises a TiO 2 -doped quartz glass.

9. The optical element of claim 1 , wherein the glass comprises a glass ceramic.

10. The optical element of claim 1 , wherein the substrate comprises a material that is at least partially absorbent for radiation at the wavelength, and a maximum absorbance of the absorbing layer is at wavelengths of more than 1500 nm.

11. The optical element of claim 10 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.

12. The optical element of claim 11 , wherein the glass comprises a glass selected from the group consisting of a silicate glass, a quartz glass and a glass ceramic.

13. The optical element of claim 10 , wherein the glass comprises glass selected from the group consisting of a silicate glass, a quartz glass and a glass ceramic.

14. The optical element of claim 1 , wherein the substrate comprises a material that is at least partially absorbent for radiation at the wavelength, and the glass comprises a glass selected from the group consisting of a silicate glass, a quartz glass and a glass ceramic.

15. The optical element of claim 14 , wherein a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm.

16. The optical element of claim 1 , wherein:
a maximum absorbance of the absorbing layer is at wavelengths of more than 1500 nm;
a maximum suppression of the anti-reflection layer is at wavelengths of more than 1500 nm; and
the glass comprises a glass selected from the group consisting of a silicate glass, a quartz glass and a glass ceramic.

17. An arrangement, comprising:
an optical element according to claim 1 ; and
a light source configured to generate radiation at a wavelength in a range selected from the group consisting of visible radiation and infrared radiation,
wherein the second coating is between the light source and the substrate.

18. The arrangement of claim 17 , wherein:
the arrangement comprises a plurality of light sources in a grid-type arrangement; and
for each light source, the second coating is between the light source and the substrate.

19. The arrangement of claim 18 , wherein the arrangement is an EUV lithography apparatus.

20. The arrangement of claim 17 , wherein the arrangement is an EUV lithography apparatus.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Bittner Boris
• Wabra Norbert
• Schmidt Holger
• Schoemer Ricarda
• Schneider Sonja

Classifications

• G21K1/067

  using surface reflection, e.g. grazing incidence mirrors, gratings (multilayer mirrors G21K1/062) · CPC title

• G02B5/3075

  for use in the UV (G02B5/3066 takes precedence) · CPC title

• G02B5/0816

  Multilayer mirrors, i.e. having two or more reflecting layers (G02B5/0883, G02B5/0891 take precedence) · CPC title

• G03F7/70958

  Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties · CPC title

• G03F7/70266

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title