Optical element and optical arrangement therewith

Patent metadata

Field	Value
Publication number	US-10474036-B2
Application number	US-201615257349-A
Country	US
Kind code	B2
Filing date	Sep 6, 2016
Priority date	Mar 6, 2014
Publication date	Nov 12, 2019
Grant date	Nov 12, 2019

Abstract

An optical arrangement includes an optical element (1) and a thermal manipulation device. The optical element has a substrate (2), a coating (3, 9, 5) applied to the substrate (2), and an antireflection coating (3). The coating (3, 9, 5) includes: a reflective multi-layer coating (5b) configured to reflect radiation (4) with a used wavelength (λEUV). The antireflection coating (3) is arranged between the substrate (2) and the reflective multi-layer coating (5b) to suppress reflection of heating radiation (7) with a heating wavelength (λH) that differs from the used wavelength (λEUV). The thermal manipulation device has at least one heating light source (8) to produce heating radiation (7).

First claim

What is claimed is:

1. An optical arrangement comprising at least one optical element and at least one thermal manipulation device, wherein the optical element comprises:
a substrate, an overall coating applied to the substrate, the overall coating comprising:
a reflective multi-layer coating configured to reflect radiation having a wavelength in an EUV wavelength range, and
an antireflection coating arranged between the substrate and the reflective multi-layer coating and configured to suppress reflection of heating radiation having a heating wavelength that differs from the wavelength in the EUV wavelength range, and

wherein the thermal manipulation device comprises at least one heating light source configured to produce the heating radiation,
wherein the thermal manipulation device is configured to radiate the heating radiation through the substrate and onto the antireflection coating,
wherein the antireflective coating is matched to properties of the substrate such that the antireflective coating has an antireflective effect on the heating radiation incident on the antireflective coating through the substrate, and
wherein the suppression of the reflection of the heating radiation by the antireflection coating is maximal for a heating wavelength of more than 400 nm and less than 900 nm.

2. The optical arrangement according to claim 1 , wherein the overall coating applied to the substrate is configured to completely absorb the heating radiation.

3. The optical arrangement according to claim 1 , wherein the antireflection coating is configured to at least partly absorb the heating radiation.

4. The optical arrangement according to claim 1 , wherein the overall coating further comprises an absorbing coating configured to at least partly absorb the heating radiation.

5. The optical arrangement according to claim 4 , wherein the absorbing coating is arranged adjacent to the antireflection coating.

6. The optical arrangement according to claim 4 , wherein the absorbing coating is arranged between the antireflection coating and the reflective multi-layer coating.

7. The optical arrangement according to claim 4 , wherein the absorbing coating is a multi-layer coating.

8. The optical arrangement according to claim 4 , wherein the absorbing coating includes at least one metallic material.

9. The optical arrangement according to claim 1 , wherein the substrate is formed from a material which is at least partly transparent to the heating radiation.

10. The optical arrangement according to claim 1 , wherein the antireflection coating includes at least one material selected from the group comprising: B 4 C, Si, Si 3 N 4 , C, Ru, Mo, Ni, ZrN, SiC, ZrO 2 , La, B.

11. The optical arrangement according to claim 1 , wherein the antireflection coating has a thickness of less than 500 nm.

12. The optical arrangement according to claim 1 , wherein a reflectivity of the reflective multi-layer coating is maximal for extreme ultraviolet (EUV) radiation with a wavelength of between 1 nm and 35 nm.

13. The optical arrangement according to claim 12 , configured as an EUV mirror or as an EUV mask.

14. The optical arrangement according to claim 1 , wherein a reflectivity of the reflective multi-layer coating is maximal for very ultraviolet (VUV) radiation with a wavelength of between 150 nm and 260 nm.

15. The optical arrangement according to claim 14 , wherein the reflective multi-layer coating comprises at least one layer configured to at least partly absorb the heating radiation at the heating wavelength.

16. The optical arrangement according to claim 1 , wherein the thermal manipulation device comprises a plurality of heating light sources in a grid-shaped arrangement.

17. The optical arrangement according to claim 1 , wherein the at least one heating light source is attached to a cooling body configured to cool the optical element.

18. The optical arrangement according to claim 1 , configured as an EUV lithography apparatus.

19. The optical arrangement according to claim 17 , wherein the optical element is configured as an EUV mask displaceable in a movement direction.

20. The optical arrangement according to claim 19 , wherein the at least one heating light source configured to output the heating radiation onto the EUV mask, a deflection device configured to deflect the heating radiation onto the EUV mask and/or a beam guidance device configured to guide the heating radiation onto the EUV mask is/are mounted to be stationary with respect to the EUV mask when the EUV mask is displaced in the movement direction.

21. The optical arrangement according to claim 1 , configured as a catadioptric projection lens for VUV microlithography.

22. The optical arrangement according to claim 21 , wherein the optical element is arranged in a region of a pupil plane of the catadioptric projection lens.

23. The optical arrangement according to claim 1 , further comprising a deflection device configured to deflect the heating radiation from the heating light source onto the optical element, wherein the deflection device is attached to a cooling body configured to cool the optical element.

24. The optical arrangement according to claim 1 , further comprising a beam guidance device configured to guide the heating radiation from the heating light source onto the optical element, wherein the beam guidance device is attached to a cooling body configured to cool the optical element.

Assignees

• Zeiss Carl Smt Gmbh

Inventors

• Paul Hans-Jochen
• Bittner Boris
• Wabra Norbert
• Schicketanz Thomas

Classifications

• G03F7/70266 Primary

  Adaptive optics, e.g. deformable optical elements for wavefront control, e.g. for aberration adjustment or correction · CPC title

• G03F7/70958

  Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties · CPC title

• G03F7/70316

  Details of optical elements, e.g. of Bragg reflectors, extreme ultraviolet [EUV] multilayer or bilayer mirrors or diffractive optical elements · CPC title

• G03F7/70891

  Temperature · CPC title

• G02B5/0891

  Ultraviolet [UV] mirrors (apparatus for microlithography exposure G03F7/70; X-ray multilayer structures G21K1/06) · CPC title