Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
US-12372779-B2 · Jul 29, 2025 · US
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Bencher Christopher patents
Bencher Christopher is listed as an inventor on 19 patents in our database. Major assignees and classification codes are summarized below.
| Metric | Value |
|---|---|
| Inventor | Bencher Christopher |
| Total patents | 19 |
| First publication | Oct 1, 2015 |
| Latest publication | Jul 29, 2025 |
Notable patents
Publications ranked by popularity score, then publication date.
Repair methods for micro-led displays using intensity averaging
US-2024387481-A1 · Nov 21, 2024 · US
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
US-2024184097-A1 · Jun 6, 2024 · US
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
US-11899198-B2 · Feb 13, 2024 · US
Multi-focal-plane scanning using time delay integration imaging
US-2024044863-A1 · Feb 8, 2024 · US
Controlling light source wavelengths for selectable phase shifts between pixels in digital lithography systems
US-2023408807-A1 · Dec 21, 2023 · US
Decreasing distortion by modifying pixel spacing
US-11822253-B2 · Nov 21, 2023 · US
Decreasing Distortion by Modifying Pixel Spacing
US-2022357665-A1 · Nov 10, 2022 · US
Method for manufacturing a polarizer apparatus, polarizer apparatus, and display system having a polarizer apparatus
US-10877199-B2 · Dec 29, 2020 · US
Method for manufacturing a polarizer apparatus, polarizer apparatus, and display system having a polarizer apparatus
US-2019257991-A1 · Aug 22, 2019 · US
Recent patents
Latest publications not already listed above.
Controlling photo acid diffusion in lithography processes
US-10108093-B2 · Oct 23, 2018 · US
Enhanced illumination efficiency in maskless, programmable optical lithography systems
US-2018074311-A1 · Mar 15, 2018 · US
Controlling photo acid diffusion in lithography processes
US-2018052396-A1 · Feb 22, 2018 · US
Controlling photo acid diffusion in lithography processes
US-9798240-B2 · Oct 24, 2017 · US
Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods
US-9395631-B2 · Jul 19, 2016 · US
Electric/magnetic field guided acid diffusion
US-9377692-B2 · Jun 28, 2016 · US
Controlling photo acid diffusion in lithography processes
US-2016011518-A1 · Jan 14, 2016 · US
Electric/magnetic field guided acid diffusion
US-2015355549-A1 · Dec 10, 2015 · US
Multi-beam pattern generators employing yaw correction when writing upon large substrates, and associated methods
US-2015277232-A1 · Oct 1, 2015 · US
Major assignees
Companies most often associated with this inventor's publications.
| Assignee | Patents |
|---|---|
| Applied Materials Inc | 19 |
Top CPC classifications
Most common classification codes across this inventor's patents.
| CPC | Patents |
|---|---|
| G03F7/70291 | 8 |
| G03F7/26 | 6 |
| G03F7/38 | 6 |
| G02B26/0833 | 5 |
| G03F7/70275 | 4 |