Substrate treatment method, and computer storage medium
US-2024036473-A1 · Feb 1, 2024 · US
between different workstations
between different workstations · Cooperative Patent Classification (CPC)
Electric circuits, power, telecommunications, and semiconductors.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | H10P72/32 |
| Official title | {between different workstations} |
| Display label | between different workstations |
| Total patents | 572 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 34 |
| 2016 | 36 |
| 2017 | 36 |
| 2018 | 37 |
| 2019 | 46 |
| 2020 | 67 |
| 2021 | 70 |
| 2022 | 58 |
| 2023 | 55 |
| 2024 | 60 |
| 2025 | 61 |
| 2026 | 12 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Service tunnel for use on capital equipment in semiconductor manufacturing and research fabs
US-9502275-B1 · Nov 22, 2016 · US
Wafer position correction with a dual, side-by-side wafer transfer robot
US-9496159-B2 · Nov 15, 2016 · US
Workpiece transfer system
US-2016322245-A1 · Nov 3, 2016 · US
Carousel reactor for multi-station, sequential processing systems
US-9484233-B2 · Nov 1, 2016 · US
Mechanism for and method of correcting yawing of conveyed workpiece
US-9475651-B2 · Oct 25, 2016 · US
Method for forming semiconductor device structure
US-2016307816-A1 · Oct 20, 2016 · US
Particle moving apparatus and method for moving a particle in a liquid
US-2016281256-A1 · Sep 29, 2016 · US
Method of Manufacturing Semiconductor Device
US-2016284581-A1 · Sep 29, 2016 · US
Processing systems and methods for halide scavenging
US-9449850-B2 · Sep 20, 2016 · US
Vacuum treatment apparatus
US-2016265109-A1 · Sep 15, 2016 · US
Vacuum processing apparatus
US-9443749-B2 · Sep 13, 2016 · US
Wafer handling traction control system
US-9434071-B2 · Sep 6, 2016 · US
Workpiece transfer system
US-9412633-B2 · Aug 9, 2016 · US
Semiconductor process equipment
US-2016218029-A1 · Jul 28, 2016 · US
Methods and systems for electric field deposition of nanowires and other devices
US-9390951-B2 · Jul 12, 2016 · US
Apparatus for processing semiconductor wafers, in particular for carrying out a polymers removal process step
US-9385011-B2 · Jul 5, 2016 · US
Substrate processing apparatus and substrate processing method
US-9378991-B2 · Jun 28, 2016 · US
Processing object transport system, and substrate inspection system
US-2016163576-A1 · Jun 9, 2016 · US
Substrate processing system, transfer module, substrate processing method, and method for manufacturing semiconductor element
US-9312153-B2 · Apr 12, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC H10P72/32?
- CPC H10P72/32 is the Cooperative Patent Classification code for “between different workstations.”
- How many patents are filed under CPC H10P72/32 (between different workstations)?
- Our database includes 572 publications tagged with this CPC code.
- Is patent activity under CPC H10P72/32 growing?
- Publication counts under this code: 60 in 2024 vs 61 in 2025 (latest complete years).