using a lift-off resist pattern or a release layer pattern

using a lift-off resist pattern or a release layer pattern · Cooperative Patent Classification (CPC)

Electric circuits, power, telecommunications, and semiconductors.

Related technology areas

Mapped technology topics for this CPC code.

CPC classification statistics
MetricValue
CPC codeH05K3/048
Official title{using a lift-off resist pattern or a release layer pattern}
Display labelusing a lift-off resist pattern or a release layer pattern
Total patents85

Filing trend

Year-over-year patent counts classified under this CPC code.

Filing activity over the last five years is growing.

Patents filed per year
YearPatents
201511
201610
201712
20185
20197
202011
20215
20223
20239
20244
20258

Representative patents

Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.

Frequently asked questions

Answers are generated from the same data shown on this page.

What is CPC H05K3/048?
CPC H05K3/048 is the Cooperative Patent Classification code for “using a lift-off resist pattern or a release layer pattern.”
How many patents are filed under CPC H05K3/048 (using a lift-off resist pattern or a release layer pattern)?
Our database includes 85 publications tagged with this CPC code.
Is patent activity under CPC H05K3/048 growing?
Publication counts under this code: 4 in 2024 vs 8 in 2025 (latest complete years).