Device modified substrate article and methods for making
US-2017182744-A1 · Jun 29, 2017 · US
US10485109B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-10485109-B2 |
| Application number | US-201715794863-A |
| Country | US |
| Kind code | B2 |
| Filing date | Oct 26, 2017 |
| Priority date | Oct 28, 2016 |
| Publication date | Nov 19, 2019 |
| Grant date | Nov 19, 2019 |
A practical reading order for non-experts. Skip the full description unless you need deep technical detail.
What the patent document calls the invention.
A short plain-language summary of the technical disclosure.
Who owns or filed the patent and who is credited as inventor.
Filing, priority, publication, and grant dates set the timeline.
The legal scope of protection — read this for what is actually claimed.
Technology tags used to group this patent with similar filings.
Prior art links and similar publications in this corpus.
Official abstract text for this publication.
Flexible electrical devices comprising electrode layers on softening polymers and methods of manufacturing such devices, including lift-off processes for forming electrodes on softening polymers, processes for forming devices with a patterned double softening polymer layer, and solder reflow processes for forming electrical contacts on softening polymers.
Opening claim text (preview).
The invention claimed is: 1. A method of manufacturing an electrical device, comprising: forming a softening polymer layer with an electrode layer on a surface of the softening polymer layer; forming a second softening polymer cover layer on the surface of the softening polymer layer, wherein: a mechanical neutral plane of the electrical device is located at or above the surface of the softening polymer layer, and an opening in the second softening polymer cover layer exposes a portion of a surface of the electrode layer, wherein the softening polymer layer and second softening polymer cover layer are composed of a softening polymer having a Young's modulus that decreases by more than 1 order of magnitude within an about 30° C. temperature increase. 2. The method of claim 1 , further including: forming an inorganic hardmask layer on the second softening polymer cover layer; removing, by a reactive ion etch process, a portion of the inorganic hardmask layer exposed through an opening in a patterned photoresist layer located on the inorganic hardmask layer to form an opening in the inorganic hardmask layer; removing, by the reactive ion etch process, exposed portions of the cover layer underlying the opening in the inorganic hardmask layer to form the opening in the second softening polymer cover layer; and removing the patterned photoresist layer and the inorganic hardmask layer. 3. The method of claim 2 , further including: depositing a second electrode layer on the inorganic liftoff layer and the portion of the surface of the electrode layer. 4. The method of claim 3 , further including removing the inorganic hardmask layer by a horizontal liftoff etch that includes exposing the inorganic hardmask layer to an ester-based photoresist removing solvent or a potassium borate photo developing solution. 5. The method of claim 1 , further including exposing the surface of the softening polymer layer to a reactive ion etch treatment before forming the second softening polymer cover layer on the surface of the softening polymer layer, wherein the surface of the softening polymer layer after the reactive ion etch treatment has an at least double a root mean squared surface roughness as compared to the surface before the reactive ion etch treatment, and a thickness of the softening polymer layer after the reactive ion etch treatment is within about ±5 percent of the thickness of the softening polymer layer before the reactive ion etch treatment. 6. The method of claim 2 , wherein the removing, by the reactive ion etch process, of the exposed portions of the cover layer includes forming a plasma formed from a feed gas of oxygen at about 200 W biasing power and a pressure of about 200 mTorr. 7. The method of claim 1 , wherein the within about 30° C. temperature increase is from about 20° C. to about 50° C. 8. The method of claim 1 , wherein the within about 30° C. temperature increase is from about 20° C. to about 37° C.
by screen printing or stencil printing · CPC title
for lift-off processes · CPC title
Solder materials or compositions specially adapted therefor · CPC title
After-treatment of the printed patterns, e.g. sintering or curing methods · CPC title
Flexible materials (H05K1/038 takes precedence; specific organic compositions are classified in H05K1/0313 and subgroups) · CPC title
Related publications grouped by family.
Answers are generated from the same data shown on this page.