Display and method of producing display
US-2019333418-A1 · Oct 31, 2019 · US
Masking pattern being obtained by thermal means, e.g. laser ablation
Masking pattern being obtained by thermal means, e.g. laser ablation · Cooperative Patent Classification (CPC)
Computing, optics, measurement, and control technologies.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | G03F7/202 |
| Official title | {Masking pattern being obtained by thermal means, e.g. laser ablation} |
| Display label | Masking pattern being obtained by thermal means, e.g. laser ablation |
| Total patents | 183 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is stable.
| Year | Patents |
|---|---|
| 2015 | 27 |
| 2016 | 16 |
| 2017 | 5 |
| 2018 | 10 |
| 2019 | 18 |
| 2020 | 23 |
| 2021 | 14 |
| 2022 | 19 |
| 2023 | 20 |
| 2024 | 17 |
| 2025 | 13 |
| 2026 | 1 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Method of manufacturing semiconductor device
US-10217635-B2 · Feb 26, 2019 · US
Flexographic printing plate, flexographic printing plate precursor, and manufacturing methods therefor
US-2018304663-A1 · Oct 25, 2018 · US
Method of fabricating substrate structure and substrate structure fabricated by the same method
US-10087527-B2 · Oct 2, 2018 · US
Resin laminate and relief printing original plate
US-10042257-B2 · Aug 7, 2018 · US
Photoactivable nitrogen bases
US-2018217498-A1 · Aug 2, 2018 · US
Thermal treatment apparatus, thermal treatment method, and non-transitory computer storage medium
US-2018182611-A1 · Jun 28, 2018 · US
Material Composition and Methods Thereof
US-2018177055-A1 · Jun 21, 2018 · US
Pattern forming method for forming a pattern
US-2018143536-A1 · May 24, 2018 · US
Method for preparing flexographic printing plates
US-2018134030-A1 · May 17, 2018 · US
Method for preparing halftone phase shift mask blank, halftone phase shift mask blank, halftone phase shift mask, and thin film forming apparatus
US-2018059532-A1 · Mar 1, 2018 · US
Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition
US-2018011405-A1 · Jan 11, 2018 · US
A novel system for reducing ablation debris
US-2017326869-A1 · Nov 16, 2017 · US
Illumination apparatus, optical apparatus, imprint apparatus, projection apparatus, and method of manufacturing article
US-2017285331-A1 · Oct 5, 2017 · US
Method of Manufacturing Semiconductor Device
US-2017278710-A1 · Sep 28, 2017 · US
Lithographic apparatus and method
US-9632435-B2 · Apr 25, 2017 · US
Photosensitive resin composition, photosensitive film, rib pattern formation method, hollow structure and formation method for same, and electronic component
US-9625814-B2 · Apr 18, 2017 · US
Hard mask composition and method for forming pattern using same
US-9529257-B2 · Dec 27, 2016 · US
Printing form precursor, a process for making the precursor, and a method for preparing a printing form from the precursor
US-2016355004-A1 · Dec 8, 2016 · US
Monomer, hard mask composition comprising said monomer, and method for forming pattern using said hard mask composition
US-9513546-B2 · Dec 6, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC G03F7/202?
- CPC G03F7/202 is the Cooperative Patent Classification code for “Masking pattern being obtained by thermal means, e.g. laser ablation.”
- How many patents are filed under CPC G03F7/202 (Masking pattern being obtained by thermal means, e.g. laser ablation)?
- Our database includes 183 publications tagged with this CPC code.
- Is patent activity under CPC G03F7/202 growing?
- Publication counts under this code: 17 in 2024 vs 13 in 2025 (latest complete years).