Illumination apparatus, optical apparatus, imprint apparatus, projection apparatus, and method of manufacturing article

Patent metadata

Field	Value
Publication number	US-2017285331-A1
Application number	US-201715472659-A
Country	US
Kind code	A1
Filing date	Mar 29, 2017
Priority date	Mar 31, 2016
Publication date	Oct 5, 2017
Grant date	—

Abstract

The present invention provides an illumination apparatus which performs oblique illumination, the apparatus including a first optical element formed with an array of a plurality of optical components each configured to generate a point light source, and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.

First claim

What is claimed is:

1 . An illumination apparatus which performs oblique illumination, the apparatus comprising:
a first optical element formed with an array of a plurality of optical components each configured to generate a point light source; and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.

2 . The apparatus according to claim 1 , wherein the illumination region is caused to have a rectangular shape by the compensation.

3 . The apparatus according to claim 1 , wherein the rotation angle of the first optical element is different from the rotation angle of the second optical element.

4 . The apparatus according to claim 3 , wherein a shape of the illumination region is closer to a rectangle than that in a case where the rotation angle of the first optical element is equal to the rotation angle of the second optical element.

5 . The apparatus according to claim 2 , wherein the optical axis has an azimuth of 45° relative to one side of the rectangle and an elevation angle of 24° relative to a normal to a plane to be illuminated.

6 . The apparatus according to claim 1 , wherein a plane to be illuminated is a Fourier transform plane with respect to an exit plane of the first optical element.

7 . The apparatus according to claim 1 , wherein the first optical element has 2.8° as the rotation angle, and
the second optical element has 77.2° as the rotation angle.

8 . The apparatus according to claim 1 , wherein the array comprises a microlens array.

9 . The apparatus according to claim 1 , wherein the second optical element comprises at least one of a cylindrical lens, an anamorphic lens, and a toric lens.

10 . An optical apparatus comprising:
a mirror array formed with an array of a plurality of mirrors each having a drive axis, an arranging direction of the plurality of mirrors being different from a direction of the drive axis; and an illumination apparatus defined in claim 1 and configured to illuminate the mirror array.

11 . An imprint apparatus which molds an imprint material on a substrate to form a pattern on the substrate, the apparatus comprising:
a heating device configured to heat the substrate by illuminating the substrate to deform the substrate, wherein the heating device includes an illumination apparatus defined in claim 1 and is configured to heat the substrate by illuminating the substrate via the illumination apparatus.

12 . An imprint apparatus which molds an imprint material on a substrate to form a pattern on the substrate, the apparatus comprising:
a heating device configured to heat the substrate by illuminating the substrate to deform the substrate, wherein the heating device includes an optical apparatus and is configured to heat the substrate by illuminating the substrate via the optical apparatus, wherein the optical apparatus includes a mirror array formed with an array of a plurality of mirrors each having a drive axis, an arranging direction of the plurality of mirrors being different from a direction of the drive axis, and an illumination apparatus defined in claim 1 and configured to illuminate the mirror array.

13 . A projection apparatus comprising:
a projection device configured to project an image, wherein the projection device includes an illumination apparatus defined in claim 1 and is configured to project the image via the illumination apparatus.

14 . A method of manufacturing an article, the method comprising steps of:
forming a pattern on a substrate using an imprint apparatus; and processing the substrate, on which the pattern has been formed, to manufacture the article, wherein the imprint apparatus molds an imprint material on the substrate to form a pattern on the substrate, and includes: a heating device configured to heat the substrate by illuminating the substrate to deform the substrate, wherein the heating device includes an illumination apparatus and is configured to heat the substrate by illuminating the substrate via the illumination apparatus, wherein the illumination apparatus performs oblique illumination and includes: a first optical element formed with an array of a plurality of optical components each configured to generate a point light source; and a second optical element configured to receive light from the first optical element and form an illumination region, with a power thereof in one direction being different from a power thereof in a direction perpendicular to the one direction, wherein at least one of the first optical element and the second optical element has a rotation angle about an optical axis thereof so as to perform compensate for distortion of the illumination region by the oblique illumination.

Assignees

• Canon Kk

Inventors

• Miyaharu Takafumi
• Shinoda Ken-Ichiro
• Matsumoto Takahiro
• Sato Kazuhiro

Classifications

• G02B26/0833 Primary

  the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD (G02B26/0825 takes precedence; micromechanical devices in general B81B) · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• G02B27/0025

  for optical correction, e.g. distorsion, aberration · CPC title

• G02B3/0006

  Arrays (G02B3/02, G02B5/188 take precedence) · CPC title

• G03F7/7015 Primary

  Details of optical elements · CPC title