using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams

using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams · Cooperative Patent Classification (CPC)

Computing, optics, measurement, and control technologies.

Related technology areas

Mapped technology topics for this CPC code.

CPC classification statistics
MetricValue
CPC codeG02B5/1857
Official title{using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams}
Display labelusing exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Total patents1,055

Filing trend

Year-over-year patent counts classified under this CPC code.

Filing activity over the last five years is declining.

Patents filed per year
YearPatents
201528
201643
201746
201852
201991
2020155
2021143
2022138
2023129
2024115
202593
202622

Representative patents

Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.

Frequently asked questions

Answers are generated from the same data shown on this page.

What is CPC G02B5/1857?
CPC G02B5/1857 is the Cooperative Patent Classification code for “using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams.”
How many patents are filed under CPC G02B5/1857 (using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams)?
Our database includes 1,055 publications tagged with this CPC code.
Is patent activity under CPC G02B5/1857 growing?
Publication counts under this code: 115 in 2024 vs 93 in 2025 (latest complete years).