Capacitively coupled electrodeless plasma apparatus and a method using capacitively coupled electrodeless plasma for processing a silicon substrate
US-9837562-B2 · Dec 5, 2017 · US
using external electrodes, e.g. in tunnel type reactors
using external electrodes, e.g. in tunnel type reactors · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C23C16/507 |
| Official title | using external electrodes, e.g. in tunnel type reactors |
| Display label | using external electrodes, e.g. in tunnel type reactors |
| Total patents | 279 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is growing.
| Year | Patents |
|---|---|
| 2015 | 31 |
| 2016 | 17 |
| 2017 | 28 |
| 2018 | 20 |
| 2019 | 30 |
| 2020 | 26 |
| 2021 | 18 |
| 2022 | 24 |
| 2023 | 25 |
| 2024 | 27 |
| 2025 | 29 |
| 2026 | 4 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Tandem source activation for cvd of films
US-2017327947-A1 · Nov 16, 2017 · US
Semiconductor device manufacturing method, substrate processing apparatus and recording medium
US-2017268105-A1 · Sep 21, 2017 · US
Multilayer iron nitride hard magnetic materials
US-2017243680-A1 · Aug 24, 2017 · US
Tandem source activation for CVD of films
US-9738972-B2 · Aug 22, 2017 · US
Nanolayer deposition using bias power treatment
US-9708707-B2 · Jul 18, 2017 · US
Superhydrophobic compositions and coating process for the internal surface of tubular structures
US-9701869-B2 · Jul 11, 2017 · US
Method of manufacturing semiconductor device, including film having uniform thickness
US-9601326-B2 · Mar 21, 2017 · US
Apparatus for coating a film in a container and method for coating the film
US-2017062189-A1 · Mar 2, 2017 · US
Substrate processing apparatus and substrate processing method
US-2017053779-A1 · Feb 23, 2017 · US
Method of manufacturing semiconductor device
US-2017040232-A1 · Feb 9, 2017 · US
Method and apparatus for gas abatement
US-2017027049-A1 · Jan 26, 2017 · US
Ion beam activated directional deposition
US-9520284-B1 · Dec 13, 2016 · US
Substrate processing apparatus
US-2016326651-A1 · Nov 10, 2016 · US
Pulsed remote plasma method and system
US-9484191-B2 · Nov 1, 2016 · US
Laminate film and flexible electronic device
US-2016312363-A1 · Oct 27, 2016 · US
Laminated film and flexible electronic device
US-2016312362-A1 · Oct 27, 2016 · US
Touch sensor for curved display and method for manufacturing the same
US-2016274706-A1 · Sep 22, 2016 · US
Substrate processing apparatus and substrate processing system
US-9431220-B1 · Aug 30, 2016 · US
Substrate processing device equipped with semicircle shaped antenna
US-9416451-B2 · Aug 16, 2016 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C23C16/507?
- CPC C23C16/507 is the Cooperative Patent Classification code for “using external electrodes, e.g. in tunnel type reactors.”
- How many patents are filed under CPC C23C16/507 (using external electrodes, e.g. in tunnel type reactors)?
- Our database includes 279 publications tagged with this CPC code.
- Is patent activity under CPC C23C16/507 growing?
- Publication counts under this code: 27 in 2024 vs 29 in 2025 (latest complete years).