Fluorinated alkoxyvinyl ethers and methods for preparing fluorinated alkoxyvinyl ethers
US-2021355057-A1 · Nov 18, 2021 · US
containing halogen
containing halogen · Cooperative Patent Classification (CPC)
Chemical and metallurgical processes, compounds, and materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | C11D7/28 |
| Official title | containing halogen |
| Display label | containing halogen |
| Total patents | 134 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 12 |
| 2016 | 5 |
| 2017 | 6 |
| 2018 | 4 |
| 2019 | 9 |
| 2020 | 9 |
| 2021 | 17 |
| 2022 | 22 |
| 2023 | 15 |
| 2024 | 17 |
| 2025 | 13 |
| 2026 | 5 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Composition, method for cleaning adhesive polymer, method for producing device wafer, and method for regenerating support wafer
US-2021317390-A1 · Oct 14, 2021 · US
Quaternary Alkylammonium Hypochlorite Solution, Method for Manufacturing Same, and Method for Cleaning Semiconductor Wafer
US-2021309942-A1 · Oct 7, 2021 · US
Fluorinated diaminoolefins and methods of using the same
US-2021302113-A1 · Sep 30, 2021 · US
1,2-dichloro-1-(2,2,2-trifluoroethoxy)ethylene, production method therefor, and uses thereof
US-11111196-B2 · Sep 7, 2021 · US
Treatment liquid, kit, and method for washing substrate
US-11072767-B2 · Jul 27, 2021 · US
1,2-dichloro-1-(2,2,2-trifluoroethoxy)ethylene, production method therefor, and uses thereof
US-2021179977-A1 · Jun 17, 2021 · US
Aqueous composition and cleaning method using same
US-2021155881-A1 · May 27, 2021 · US
Composition for TiN hard mask removal and etch residue cleaning
US-11017995-B2 · May 25, 2021 · US
Uses of fluorinated epoxides and novel mixtures thereof
US-2021139441-A1 · May 13, 2021 · US
Hydrofluoroolefin ethers, compositions, apparatuses and methods for using same
US-2021101858-A1 · Apr 8, 2021 · US
Azeotropic composition containing 1,1,1,3,3,3-hexafluoro-2-methoxypropane
US-2021079321-A1 · Mar 18, 2021 · US
Treatment Liquid for Semiconductor Wafers, Which Contains Hypochlorite Ions
US-2021062115-A1 · Mar 4, 2021 · US
Aqueous composition and cleaning method using same
US-2021047593-A1 · Feb 18, 2021 · US
Stable bleaching composition
US-10883070-B2 · Jan 5, 2021 · US
Azeotropic composition containing 1,1,1,3,3,3-hexafluoro-2-methoxypropane
US-10836983-B2 · Nov 17, 2020 · US
Method of cleaning and drying semiconductor substrate
US-10811247-B2 · Oct 20, 2020 · US
Cleaning compositions
US-10787628-B2 · Sep 29, 2020 · US
Moderately alkaline cleaning compositions for proteinaceous and fatty soil removal at low temperatures
US-2020255768-A1 · Aug 13, 2020 · US
Ternary solvent composition and method for removing a coating from a surface
US-10717885-B2 · Jul 21, 2020 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC C11D7/28?
- CPC C11D7/28 is the Cooperative Patent Classification code for “containing halogen.”
- How many patents are filed under CPC C11D7/28 (containing halogen)?
- Our database includes 134 publications tagged with this CPC code.
- Is patent activity under CPC C11D7/28 growing?
- Publication counts under this code: 17 in 2024 vs 13 in 2025 (latest complete years).