Cleaning compositions

Patent metadata

Field	Value
Publication number	US-10787628-B2
Application number	US-201816106331-A
Country	US
Kind code	B2
Filing date	Aug 21, 2018
Priority date	Aug 22, 2017
Publication date	Sep 29, 2020
Grant date	Sep 29, 2020

Abstract

The present disclosure is directed to non-corrosive cleaning compositions that are useful, e.g., for removing residues (e.g., plasma etch and/or plasma ashing residues) and/or metal oxides from a semiconductor substrate as an intermediate step in a multistep manufacturing process.

First claim

What is claimed is:

1. A cleaning composition, comprising:
a) at least one fluoride containing compound;
b) at least one tetrazole;
c) at least one triazine in an amount of from about 0.02 wt % to about 0.1 wt % of the composition;
d) at least one organic solvent; and
e) water.

2. The composition of claim 1 , wherein the at least one tetrazole comprises a substituted or unsubstituted tetrazole.

3. The composition of claim 1 , wherein the at least one tetrazole comprises a tetrazole optionally substituted by at least one substituent selected from the group consisting of COOR 1 and N(R 1 R 2 ), in which each of R 1 and R 2 , independently, is H or C 1 -C 6 alkyl.

4. The composition of claim 1 , wherein the at least one tetrazole comprises 1H-tetrazole, 1H-tetrazole-5-carboxylic acid, 5-phenyltetrazole, or 5-amino-1H-tetrazole.

5. The composition of claim 1 , wherein the at least one tetrazole is in an amount of from about 0.01 wt % to about 1.5 wt % of the composition.

6. The composition of claim 1 , wherein the at least one triazine comprises a substituted or unsubstituted triazine.

7. The composition of claim 1 , wherein the at least one triazine comprises a triazine optionally substituted by at least one substituent selected from the group consisting of aryl and N(R 3 R 4 ), in which each of R 3 and R 4 , independently, is H or C 1 -C 6 alkyl.

8. The composition of claim 1 , wherein the at least one triazine comprises benzoguanamine.

9. The composition of claim 1 , wherein the at least one triazine is in an amount of from about 0.02 wt % to about 0.09 wt % of the composition.

10. The composition of claim 1 , wherein the at least one fluoride containing compound selected from the group consisting of HF, H 2 SiF 6 , H 2 PF 6 , HBF 4 , NH 4 F, and tetraalkylammonium fluoride.

11. The composition of claim 1 , wherein the at least one fluoride containing compound is in an amount of from about 0.05 wt % to about 1.5 wt % of the composition.

12. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of alcohols, ketones, ethers, and esters.

13. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected form the group consisting of alcohols.

14. The composition of claim 13 , wherein the alcohols are alkane diols.

15. The composition of claim 14 , wherein the alkane diols are glycols.

16. The composition of claim 15 , wherein the glycols are selected from the group consisting of ethylene glycol, propylene glycol, butylene glycol, hexylene glycol, diethylene glycol, dipropylene glycol, triethylene glycol, and tetraethylene glycol.

17. The composition of claim 1 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of ethers.

18. The composition of claim 17 , wherein the at least one organic solvent comprises a solvent selected from the group consisting of glycol ethers.

19. The composition of claim 18 , wherein the glycol ethers are selected from the group consisting of ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol mono n-propyl ether, ethylene glycol monoisopropyl ether, ethylene glycol mono n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol monobutyl ether, diethylene glycol monohexyl ether, triethylene glycol monomethyl ether, triethylene glycol monoethyl ether, triethylene glycol monobutyl ether, 1-methoxy-2-propanol, 2-methoxy-1-propanol, 1-ethoxy-2-propanol, 2-ethoxy-1-propanol, propylene glycol mono-n-propyl ether, dipropylene glycol monomethyl ether, dipropylene glycol monoethyl ether, dipropylene glycol monobutyl ether, dipropylene glycol mono-n-propyl ether, tripropylene glycol monoethyl ether, tripropylene glycol monomethyl ether, ethylene glycol monobenzyl ether, and diethylene glycol monobenzyl ether.

20. The composition of claim 1 , comprising at least two organic solvents.

21. The composition of claim 1 , wherein the at least one organic solvent is in an amount of at least about 90 wt % of the composition.

22. The composition of claim 1 , wherein the water is in an amount of from about 0.1 wt % to about 2 wt % of the composition.

23. A cleaning composition, comprising:
a) at least one fluoride containing compound;
b) at least one tetrazole;
c) at least one triazine;
d) at least one organic solvent;
e) water; and
f) at least one aromatic anhydride.

24. The composition of claim 23 , wherein the aromatic anhydride comprises a benzoic anhydride, a phthalic anhydride, or 2-sulfobenzoic anhydride.

25. The composition of claim 23 , wherein the at least one aromatic anhydride is in an amount of from about 0.01% to about 0.5% by weight of the composition.

26. The composition of claim 1 , further comprising at least one triazole.

27. The composition of claim 26 , wherein the at least one triazole comprises a substituted or unsubstituted triazole.

28. The composition of claim 27 , wherein the at least one triazole comprises a triazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

29. The composition of claim 28 , wherein the at least one triazole comprises 1,2,3-triazole, 1,2,4-triazole, 3-amino-1,2,4-triazole, 3-amino-5-mercapto-1,2,4-triazole, or 3,5-diamino-1,2,4-triazole.

30. The composition of claim 26 , wherein the at least one triazole comprises a substituted or unsubstituted benzotriazole.

31. The composition of claim 30 , wherein the at least one triazole comprises a benzotriazole optionally substituted by at least one substituent selected from the group consisting of alkyl groups, aryl groups, halogen groups, amino groups, nitro groups, alkoxy groups, and hydroxyl groups.

32. The composition of claim 31 , wherein the at least one triazole comprises benzotriazole, 5-aminobenzotriazole, 1-hydroxybenzotriazole, 5-phenylthiol-benzotriazole, 5-chlorobenzotriazole, 4-chlorobenzotriazole, 5-bromobenzotriazole, 4-bromobenzotriazole, 5-fluorobenzotriazole, 4-fluorobenzotriazole, naphthotriazole, tolyltriazole, 5-phenyl-benzotriazole, 5-nitrobenzotriazole, 4-nitrobenzotriazole, 2-(5-amino-pentyl)-benzotriazole, 1-amino-benzotriazole, 5-methyl-1H-benzotriazole, benzotriazole-5-carboxylic acid, 4-methylbenzotriazole, 4-ethylbenzotriazole, 5-ethylbenzotriazole, 4-propylbenzotriazole, 5-propylbenzotriazole, 4-isopropylbenzotriazole, 5-isopropylbenzotriazole, 4-n-butylbenzotriazole, 5-n-butylbenzotriazole, 4-isobutylbenzotriazole, 5-isobutylbenzotriazole, 4-pentylbenzotriazole, 5-pentylbenzotriazole, 4-hexylbenzotriazole, 5-hexylbenzotriazole, 5-methoxybenzotriazole, 5-hydroxybenzotriazole, dihydroxypropylbenzotriazole, 1-[N,N-bis(2-ethylhexyl)aminomethyl]-benzotriazole, 5-t-butyl benzotriazole, 5-(1′,1′-diimethylpropyl)-benzotriazole, 5-(1′,1′,3′-trimethylbutyl)benzotriazole, 5-n-octyl benzotriazole, or 5-(1′,1′,3′,3′-tetramethylbutyl)benzotriazole.

33. The composition of claim 26 , wherein the at least one triazole is in an amount of from about 0.05% to about 1% by weight of the composition.

34. The composition of claim 1 , further comprising at lea

Assignees

• Fujifilm Electronic Mat Usa Inc

Inventors

• Dory Thomas
• Kneer Emil A
• Kamimura Tetsuya

Classifications

• H10P70/234

  the processing being the formation of vias or contact holes · CPC title

• C11D7/5022

  containing oxygen · CPC title

• C11D7/5004

  Organic solvents · CPC title

• C11D7/3281

  Heterocyclic compounds · CPC title

• C11D7/28

  containing halogen · CPC title