Semiconductor chamber component cleaning systems
US-11848218-B2 · Dec 19, 2023 · US
Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed
Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed · Cooperative Patent Classification (CPC)
Separating, mixing, shaping, printing, and transporting materials.
Related technology areas
Mapped technology topics for this CPC code.
| Metric | Value |
|---|---|
| CPC code | B08B3/048 |
| Official title | {Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed} |
| Display label | Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed |
| Total patents | 91 |
Filing trend
Year-over-year patent counts classified under this CPC code.
Filing activity over the last five years is declining.
| Year | Patents |
|---|---|
| 2015 | 7 |
| 2016 | 7 |
| 2017 | 1 |
| 2018 | 8 |
| 2019 | 3 |
| 2020 | 5 |
| 2021 | 12 |
| 2022 | 10 |
| 2023 | 8 |
| 2024 | 17 |
| 2025 | 7 |
| 2026 | 6 |
Representative patents
Representative publications under this CPC code from precomputed stats, or recent filings when stats are unavailable.
Polishing and cleaning method, cleaner and polishing cleaning set
US-2023364732-A1 · Nov 16, 2023 · US
Substrate processing apparatus and apparatus cleaning method
US-11745213-B2 · Sep 5, 2023 · US
Method of cleaning work and cleaning system for work
US-2023271229-A1 · Aug 31, 2023 · US
Substrate liquid processing apparatus
US-11742226-B2 · Aug 29, 2023 · US
Method of cleaning reaction tube, method of manufacturing semiconductor device, and substrate processing apparatus
US-11685993-B2 · Jun 27, 2023 · US
Substrate processing apparatus and cleaning method of mist guard
US-2023001458-A1 · Jan 5, 2023 · US
Substrate processing system and substrate processing method
US-2022392779-A1 · Dec 8, 2022 · US
Substrate processing method and substrate processing apparatus
US-11511321-B2 · Nov 29, 2022 · US
Substrate processing apparatus, substrate processing method, and storage medium
US-11476130-B2 · Oct 18, 2022 · US
Substrate processing system and substrate processing method
US-11469114-B2 · Oct 11, 2022 · US
Substrate processing device
US-11469127-B2 · Oct 11, 2022 · US
Method and apparatus for cleaning semiconductor wafer
US-2022246420-A1 · Aug 4, 2022 · US
Cleaning systems for additive manufacturing apparatuses and methods for using the same
US-2022242044-A1 · Aug 4, 2022 · US
Method and apparatus for cleaning semiconductor wafer
US-11335550-B2 · May 17, 2022 · US
Semiconductor chamber component cleaning systems
US-2022130692-A1 · Apr 28, 2022 · US
Substrate processing method and substrate processing apparatus
US-2022037173-A1 · Feb 3, 2022 · US
Method of cleaning reaction tube, method of manufacturing semiconductor device, and substrate processing apparatus
US-2021230745-A1 · Jul 29, 2021 · US
Conditioning chamber component
US-2021205858-A1 · Jul 8, 2021 · US
Method and apparatus for cleaning semiconductor wafer
US-2021166933-A1 · Jun 3, 2021 · US
Frequently asked questions
Answers are generated from the same data shown on this page.
- What is CPC B08B3/048?
- CPC B08B3/048 is the Cooperative Patent Classification code for “Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed.”
- How many patents are filed under CPC B08B3/048 (Overflow-type cleaning, e.g. tanks in which the liquid flows over the tank in which the articles are placed)?
- Our database includes 91 publications tagged with this CPC code.
- Is patent activity under CPC B08B3/048 growing?
- Publication counts under this code: 17 in 2024 vs 7 in 2025 (latest complete years).