Tantalum sputtering target
US-10266924-B2 · Apr 23, 2019 · US
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Fukushima Atsushi patents
Fukushima Atsushi holds 9 patents in our database, with recent filings and technology areas summarized below.
| Metric | Value |
|---|---|
| Total patents | 9 |
| Recent patents | 0 |
| First publication | Apr 28, 2015 |
| Latest publication | Apr 23, 2019 |
Filing trend
Year-over-year patent counts for this assignee.
Recent patents
Latest publications where this party is an assignee.
Tantalum sputtering target
US-9845528-B2 · Dec 19, 2017 · US
Sputtering target and manufacturing method therefor
US-9704695-B2 · Jul 11, 2017 · US
Titanium target for sputtering
US-9666418-B2 · May 30, 2017 · US
High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film
US-9441289-B2 · Sep 13, 2016 · US
Notable patents
Representative or frequently cited publications from precomputed assignee stats.
Tantalum sputtering target
US-10266924-B2 · Apr 23, 2019 · US
Tantalum sputtering target
US-9845528-B2 · Dec 19, 2017 · US
Sputtering target and manufacturing method therefor
US-9704695-B2 · Jul 11, 2017 · US
Titanium target for sputtering
US-9666418-B2 · May 30, 2017 · US
High-purity copper or high-purity copper alloy sputtering target, process for manufacturing the sputtering target, and high-purity copper or high-purity copper alloy sputtered film
US-9441289-B2 · Sep 13, 2016 · US
Top CPC classifications
Most common classification codes in this portfolio.
| CPC | Patents |
|---|---|
| C23C14/3414 | 7 |
| C23C14/34 | 5 |
| C22C27/02 | 3 |
| C23C14/3407 | 3 |
| H01J37/3426 | 2 |
Technology areas
Mapped technology topics for this assignee.
| Technology | Patents |
|---|---|
| Chemistry & Metallurgy | 9 |
| Electricity | 3 |
| Operations & Transport | 2 |