Electronic component metal material and method for manufacturing the same

Patent metadata

Field	Value
Publication number	US-9979110-B2
Application number	US-201214433287-A
Country	US
Kind code	B2
Filing date	Oct 31, 2012
Priority date	Oct 4, 2012
Publication date	May 22, 2018
Grant date	May 22, 2018

Abstract

There are provided an electronic component metal material having low insertability/extractability, low whisker formability and high durability, and a method for manufacturing the electronic component metal material. The electronic component metal material 10 includes a base material 11 , an A layer 14 constituting an outermost surface layer on the base material 11 and formed of Sn, In or an alloy thereof, and a B layer 13 constituting a middle layer provided between the base material 11 and the A layer 14 and formed of Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or an alloy thereof, wherein the outermost surface layer (A layer) 14 has a thickness larger than 0.2 μm, and the middle layer (B layer) 13 has a thickness of 0.001 μm or larger.

First claim

The invention claimed is:

1. An electronic component metal material comprising:
a base material;
an A layer constituting an outermost surface layer on the base material, being formed of Sn, In or an alloy thereof and having a surface arithmetic average height (Ra) of 0.1 μm or lower; and
a B layer constituting a middle layer provided between the base material and the A layer and being formed of Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or an alloy thereof, and satisfying the following (a) or (b):
(a) wherein the outermost surface layer (A layer) has a thickness larger than 0.2 μm; and
the middle layer (B layer) has a thickness of 0.001 μm or larger,
(b) wherein the outermost surface layer (A layer) has a deposition amount of the Sn, In or alloy thereof of larger than 150 μg/cm 2 ; and
the middle layer (B layer) has a deposition amount of the Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or alloy thereof of 1 μg/cm 2 or larger.

2. The electronic component metal material according to claim 1 , wherein the outermost surface layer (A layer) has an alloy composition comprising 50 mass % or more of the Sn, In or a total of the Sn and In, and the other alloy component(s) comprising one or two or more metals selected from the group consisting of Ag, As, Au, Bi, Cd, Co, Cr, Cu, Fe, Mn, Mo, Ni, Pb, Sb, W, and Zn.

3. The electronic component metal material according to claim 1 , wherein the middle layer (B layer) has an alloy composition comprising 50 mass % or more of the Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or a total of the Ag, Au, Pt, Pd, Ru, Rh, Os and Ir, and the other alloy component(s) comprising one or two or more metals selected from the group consisting of Bi, Cd, Co, Cu, Fe, In, Mn, Mo, Ni, Pb, Sb, Se, Sn, W, Tl, and Zn.

4. The electronic component metal material according to claim 1 , wherein the outermost surface layer (A layer) has a surface maximum height (Rz) of 1 μm or lower.

5. The electronic component metal material according claim 1 , wherein when a depth analysis by X-ray photoelectron spectroscopy (XPS) is carried out, a position (D 1 ) where an atomic concentration (at %) of the Sn or In in the outermost surface layer (A layer) is a maximum value and a position (D 2 ) where an atomic concentration (at %) of the Ag, Au, Pt, Pd, Ru, Rh, Os or Ir in the middle layer (B layer) is a maximum value are present in the order of D 1 and D 2 from the outermost surface.

6. The electronic component metal material according to claim 1 , wherein when a depth analysis by X-ray photoelectron spectroscopy (XPS) is carried out, the middle layer (B layer) has a maximum value of an atomic concentration (at %) of the Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of 10 at % or higher.

7. The electronic component metal material according to claim 1 , further comprising a C layer provided between the base material and the B layer and constituting an underlayer, and formed of one or two or more selected from the group consisting of Ni, Cr, Mn, Fe, Co, and Cu.

8. The electronic component metal material according to claim 7 , wherein the underlayer (C layer) has an alloy composition comprising 50 mass % or more of a total of the Ni, Cr, Mn, Fe, Co and Cu, and further comprising one or two or more selected from the group consisting of B, P, Sn, and Zn.

9. The electronic component metal material according to claim 7 , wherein when a depth analysis by X-ray photoelectron spectroscopy (XPS) is carried out, a position (D 1 ) where an atomic concentration (at %) of the Sn or In in the outermost surface layer (A layer) is a maximum value, a position (D 2 ) where an atomic concentration (at %) of the Ag, Au, Pt, Pd, Ru, Rh, Os or Ir in the middle layer (B layer) is a maximum value and a position (D 3 ) where an atomic concentration (at %) of the Ni, Cr, Mn, Fe, Co or Cu of the underlayer (C layer) is a maximum value are present in the order of D 1 , D 2 and D 3 from the outermost surface.

10. The electronic component metal material according to claim 7 , wherein when a depth analysis by X-ray photoelectron spectroscopy (XPS) is carried out, the middle layer (B layer) has a maximum value of an atomic concentration (at %) of the Ag, Au, Pt, Pd, Ru, Rh, Os or Ir of 10 at % or higher; and a depth where the underlayer (C layer) has an atomic concentration (at %) of the Ni, Cr, Mn, Fe, Co or Cu of 25% or higher is 50 nm or more.

11. The electronic component metal material according to claim 7 , wherein the underlayer (C layer) has a thickness of 0.05 μm or larger.

12. The electronic component metal material according to claim 7 , wherein the underlayer (C layer) has a deposition amount of the Ni, Cr, Mn, Fe, Co, Cu or a total of the Ni, Cr, Mn, Fe, Co and Cu of 0.03 mg/cm 2 or larger.

13. The electronic component metal material according to claim 1 , wherein the outermost surface layer (A layer) has a thickness larger than 0.2 μm and smaller than 0.6 μm.

14. The electronic component metal material according to claim 1 , wherein the outermost surface layer (A layer) has a deposition amount of Sn, In of larger than 150 μg/cm 2 and smaller than 450 μg/cm 2 .

15. The electronic component metal material according to claim 1 , wherein the middle layer (B layer) has a thickness of 0.005 to 0.1 μm.

16. The electronic component metal material according to claim 1 , wherein the middle layer (B layer) has a deposition amount of the Ag, Au, Pt, Pd, Ru, Rh, Os, Ir or a total of the Ag, Au, Pt, Pd, Ru, Rh, Os and Ir of 4 to 120 μg/cm 2 .

17. The electronic component metal material according to claim 7 , wherein when a depth analysis is carried out by X-ray photoelectron spectroscopy (XPS), between a position (D 1 ) where an atomic concentration (at %) of Sn or In in the outermost surface layer (A layer) exhibits a maximum value and a position (D 3 ) where an atomic concentration (at %) of the Ni, Cr, Mn, Fe, Co, Cu or Zn of the underlayer (C layer) exhibits a maximum value, a region having 40 at % or more of Ag, Au, Pt, Pd, Ru, Rh, Os or Ir is present in a thickness of 1 nm or larger.

18. The electronic component metal material according to claim 1 , wherein when an elemental analysis of a surface of the outermost surface layer (A layer) is carried out by a survey measurement by X-ray photoelectron spectroscopy XPS, a content of O is lower than 50 at %.

19. A connector terminal, wherein an electronic component metal material according to claim 1 comprises a contact portion.

20. An FFC terminal, wherein an electronic component metal material according to claim 1 comprises a contact portion.

21. An FPC terminal, wherein an electronic component metal material according to claim 1 comprises a contact portion.

22. An electronic component, wherein an electronic component metal material according to claim 1 comprises an electrode for external connection of the electronic component.

23. The electronic component metal material according to claim 8 , wherein when a depth analysis by X-ray photoelectron spectroscopy (XPS) is carried out, a position (D 1 ) where an atomic concentration (at %) of the Sn or In in the outermost surface layer (A layer) is a maximum value, a position (D 2 ) where an atomic concentration (at %) of the Ag, Au, Pt, Pd, Ru, Rh, Os or Ir in the middle layer (B layer) is a maximum value and a position (D 3 ) where an atomic concentration (at %) of the Ni, Cr, Mn, Fe, Co or Cu of the underlayer (C layer) is a maximum value are present in the order of D 1 , D 2 and D 3 from the outermost surface.

24. An electron

Assignees

• Jx Nippon Mining & Metals Corp
• Jx Nippin Mining & Metals Corp

Inventors

• Shibuya Yoshitaka
• Fukamachi Kazuhiko
• Kodama Atsushi

Classifications

• C22C5/06

  Alloys based on silver · CPC title

• B32B15/01

  all layers being exclusively metallic {(making layered metal workpieces by pressure cladding B23K20/22; making coatings with a metallic material characterised by its composition C23C30/00)} · CPC title

• C22C13/00

  Alloys based on tin · CPC title

• C25D5/505

  of electroplated tin coatings, e.g. by melting · CPC title

• C22C28/00

  Alloys based on a metal not provided for in groups C22C5/00 - C22C27/00 · CPC title