Ultralow expansion glass

US9890071B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9890071-B2
Application numberUS-201615291379-A
CountryUS
Kind codeB2
Filing dateOct 12, 2016
Priority dateSep 13, 2013
Publication dateFeb 13, 2018
Grant dateFeb 13, 2018

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval thereof. A lower temperature controlled anneal may occur over a temperature interval from 650° C.-875° C. or a sub-interval thereof. The controlled anneals permit independent control over CTE slope and Tzc of silica-titania glasses. The independent control provides CTE slope and Tzc values for silica-titania glasses of fixed composition over ranges heretofore possible only through variations in composition.

First claim

Opening claim text (preview).

What is claimed is: 1. A method of annealing glass comprising: providing a silica-titania glass article, said silica-titania glass article having a first Tzc and a first CTE slope at 20° C.; heating said glass article to a first temperature, said first temperature being in the range from 900° C. and 950° C.; cooling said glass article at a first rate from said first temperature to a second temperature, said second temperature being in the range from 800° C. to 850° C.; cooling said glass article at a second rate from said second temperature to a third temperature, said second rate exceeding said first rate, said third temperature being in the range from 700° C. to 750° C.; and cooling said glass article at a third rate below said third temperature, said third rate exceeding said second rate, said cooling at said third rate producing a finished silica-titania glass article, said finished silica-titania glass article having a second Tzc and a second CTE slope at 20° C., said second Tzc differing from said first Tzc. 2. The method of claim 1 , wherein said first cooling rate is in the range from 0.01° C./hour to 5.0° C./hour and said second cooling rate is in the range from 0.1° C./hour to 300° C./hour. 3. The method of claim 1 , wherein said first cooling rate is in the range from 0.10° C./hour to 5.0° C./hour and said second cooling rate is in the range from 0.5° C./hour to 100° C./hour. 4. The method of claim 1 , wherein said silica-titania glass article has a titania content in the range from 7 wt % to 12 wt %. 5. The method of claim 1 , wherein said second Tzc differs from said first Tzc by at least 4° C. and said second CTE slope at 20° C. differs from said first CTE slope at 20° C. by less than 0.05 ppb/K 2 . 6. The method of claim 1 , wherein said second Tzc differs from said first Tzc by at least 2° C. and said second CTE slope at 20° C. differs from said first CTE slope at 20° C. by less than 0.03 ppb/K 2 . 7. The method of claim 1 , wherein said second Tzc differs from said first Tzc by at least 6° C. and said second CTE slope at 20° C. differs from said first CTE slope at 20° C. by less than 0.10 ppb/K 2 . 8. The method of claim 1 , wherein said silica-titania glass article has a titania content in the range from 7.5 wt % to 9 wt %. 9. The method of claim 1 , wherein said silica-titania glass has an OH content in the range from 700 ppm to 1000 ppm. 10. A method of annealing glass comprising: providing a silica-titania glass article, said silica-titania glass article having a first Tzc and a first CTE slope at 20° C.; heating said glass article to a first temperature, said first temperature being higher than 850° C.; cooling said glass article at a first rate from said first temperature to a second temperature, said second temperature being in the range from 750° C. to 875° C.; cooling said glass article at a second rate from said second temperature to a third temperature, said second rate exceeding said first rate, said third temperature being in the range from 650° C. to 775° C.; and cooling said glass article at a third rate below said third temperature, said third rate exceeding said second rate, said cooling at said third rate producing a finished silica-titania glass article, said finished silica-titania glass article having a second Tzc and a second CTE slope at 20° C., said second Tzc differing from said first Tzc; wherein said second Tzc differs from said first Tzc by at least 4° C. and said second CTE slope at 20° C. differs from said first CTE slope at 20° C. by less than 0.05 ppb/K 2 . 11. The method of claim 10 , wherein said first cooling rate is in the range from 0.01° C./hour to 5.0° C./hour and said second cooling rate is in the range from 0.1° C./hour to 300° C./hour. 12. The method of claim 10 , wherein said first cooling rate is in the range from 0.10° C./hour to 5.0° C./hour and said second cooling rate is in the range from 0.5° C./hour to 100° C./hour. 13. The method of claim 10 , wherein said silica-titania glass article has a titania content in the range from 7 wt % to 12 wt %. 14. The method of claim 10 , wherein said first temperature is in the range from 900° C. and 950° C. 15. The method of claim 10 , wherein said second temperature is in the range from 800° C. to 850° C. 16. The method of claim 10 , wherein said third temperature is in the range from 700° C. to 750° C. 17. The method of claim 10 , wherein said second Tzc differs from said first Tzc by at least 6° C. and said second CTE slope at 20° C. differs from said first CTE slope at 20° C. by less than 0.10 ppb/K 2 . 18. The method of claim 10 , wherein said silica-titania glass article has a titania content in the range from 7.5 wt % to 9 wt %. 19. The method of claim 10 , wherein said silica-titania glass has an OH content in the range from 700 ppm to 1000 ppm.

Assignees

Inventors

Classifications

  • with more than 90% silica by weight, e.g. quartz {(C03C3/045 takes precedence)} · CPC title

  • containing titanium · CPC title

  • Glass compositions · CPC title

  • with 40% to 90% silica, by weight {(C03C3/045 takes precedence)} · CPC title

  • in a discontinuous way · CPC title

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What does patent US9890071B2 cover?
Silica-titania glasses with small temperature variations in coefficient of thermal expansion over a wide range of zero-crossover temperatures and methods for making the glasses. The method includes a cooling protocol with controlled anneals over two different temperature regimes. A higher temperature controlled anneal may occur over a temperature interval from 750° C.-950° C. or a sub-interval …
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03B25/00. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Feb 13 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).