Ultralow expansion titania-silica glass

US9822030B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9822030-B2
Application numberUS-201615003115-A
CountryUS
Kind codeB2
Filing dateJan 21, 2016
Priority dateFeb 13, 2015
Publication dateNov 21, 2017
Grant dateNov 21, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature following the isothermal hold and holding the glass at that temperature for several hours. Glasses produced by the annealing treatments exhibit high spatial uniformity of CTE, CTE slope, and fictive temperature, including in the presence of a spatially non-uniform concentration of modifier.

First claim

Opening claim text (preview).

What is claimed is: 1. An article comprising a glass, said glass having a composition comprising: 7.0 wt %-13.0 wt % TiO 2 ; 79.0 wt %-92.9 wt % SiO 2 ; and 0.1 wt %-8.0 wt % modifier; wherein said glass has an average CTE slope at 20° C. of less than 1.2 ppb/K 2 ; and wherein said glass has a non-uniform coefficient of thermal expansion at 20° C., said non-uniform coefficient of thermal expansion including a maximum coefficient of thermal expansion and a minimum coefficient of thermal expansion, the difference between said maximum coefficient of thermal expansion and said minimum coefficient of thermal expansion being greater than 0.06 ppb/K and not exceeding 5 ppb/K; and wherein said glass has a non-uniform modifier concentration, said non-uniform modifier concentration including a maximum modifier concentration and a minimum modifier concentration, the difference between said maximum modifier concentration and said minimum modifier concentration exceeding 0.03 wt %. 2. The article of claim 1 , wherein said modifier is F or B 2 O 3 . 3. The article of claim 1 , wherein said modifier is B 2 O 3 and said glass comprises 2.0 wt %-6.0 wt % of said modifier. 4. The article of claim 1 , wherein said difference between said maximum coefficient of thermal expansion and said minimum coefficient of thermal expansion does not exceed 2 ppb/K. 5. The article of claim 4 , wherein said difference between said maximum modifier concentration and said minimum modifier concentration exceeds 0.05 wt %. 6. The article of claim 5 , wherein said difference between said maximum coefficient of thermal expansion and said minimum coefficient of thermal expansion does not exceed 1 ppb/K. 7. The article of claim 6 , wherein said glass comprises 0.5 wt %-7.5 wt % of said modifier and said difference between said maximum modifier concentration and said minimum modifier concentration exceeds 0.10 wt %. 8. The article of claim 1 , wherein said difference between said maximum coefficient of thermal expansion and said minimum coefficient of thermal expansion does not exceed 3 ppb/K and said difference between said maximum modifier concentration and said minimum modifier concentration exceeds 0.05 wt %. 9. An article comprising a glass, said glass having a composition comprising: 7.0 wt %-13.0 wt % TiO 2 ; at least 79.0 wt % SiO 2 ; and a modifier, said modifier having an average concentration of at least 0.1 wt %, said glass having an average CTE slope at 20° C. less than 1.2 ppb/K 2 ; said glass including a first region and a second region, said first region having a first fictive temperature and a concentration of said modifier at least 0.03 wt % greater than said average modifier concentration, said second region having a second fictive temperature and a concentration of said modifier at least 0.03 wt % less than said average modifier concentration, said first fictive temperature exceeding said second fictive temperature. 10. The article of claim 9 , wherein said average concentration of said modifier is at least 0.5 wt %. 11. The article of claim 9 , wherein said first region has a concentration of said modifier at least 0.05 wt % greater than said average modifier concentration and said second region has a concentration of said modifier at least 0.05 wt % less than said average modifier concentration. 12. The article of claim 9 , wherein said average modifier concentration is at least 0.2 wt % and said first region has a concentration of said modifier at least 0.10 wt % greater than said average modifier concentration and said second region has a concentration of said modifier at least 0.10 wt % less than said average modifier concentration. 13. The article of claim 9 , wherein said first fictive temperature exceeds said second fictive temperature by at least 1° C. 14. The article of claim 9 , wherein said glass comprises 8.0 wt %-12.0 wt % TiO 2 and 80.0 wt %-91.9 wt % SiO 2 . 15. The article of claim 9 , wherein said average modifier concentration is at least 1.0 wt %. 16. The article of claim 9 , wherein said first fictive temperature exceeds said second fictive temperature by at least 1° C. 17. The article of claim 9 , wherein said first fictive temperature exceeds said second fictive temperature by at least 3° C.

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What does patent US9822030B2 cover?
Annealing treatments for modified titania-silica glasses and the glasses produced by the annealing treatments. The annealing treatments include an isothermal hold that facilitates equalization of non-uniformities in fictive temperature caused by non-uniformities in modifier concentration in the glasses. The annealing treatments may also include heating the glass to a higher temperature followin…
Who is the assignee on this patent?
Corning Inc
What technology area does this patent fall under?
Primary CPC classification C03C3/076. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 21 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 1 related publication on this page (citations in our corpus or others sharing the same primary CPC).