Heat treatment method of synthetic quartz glass

US9487426B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9487426-B2
Application numberUS-201514621732-A
CountryUS
Kind codeB2
Filing dateFeb 13, 2015
Priority dateFeb 21, 2014
Publication dateNov 8, 2016
Grant dateNov 8, 2016

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (ΔOH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of −7° C./hr to −30° C./hr, second heat treatment of holding at 1,030-950° C. for a time of 5-20 hours, and annealing at a rate of −25° C./hr to −85° C./hr. Two stages of heat treatment ensures that the glass has a low birefringence.

First claim

Opening claim text (preview).

The invention claimed is: 1. A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a difference (ΔOH) between maximum and minimum being less than 350 ppm and a hydroxyl concentration of 400 to 600 ppm in a central portion, comprising the steps of: first heat treatment of holding at a temperature of 1,150 to 1,060° C. for a certain time, cooling down to a second heat treatment temperature at a certain rate, second heat treatment of holding at a temperature of 1,030 to 950° C. for at least 5 hours, and annealing at a rate of −25° C./hr to −85° C./hr. 2. The method of claim 1 wherein the time of the second heat treatment is 5 to 20 hours. 3. The method of claim 1 wherein the time of the first heat treatment is 0.5 to 10 hours. 4. The method of claim 1 , wherein the heat treatment is applied to the synthetic quartz glass in the form of a block which is subsequently sliced and polished to form a substrate. 5. A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a difference (ΔOH) between maximum and minimum being at least 350 ppm and a hydroxyl concentration of 400 to 600 ppm in a central portion, comprising the steps of: first heat treatment of holding at a temperature of 1,150 to 1,060° C. for a certain time, cooling down to a second heat treatment temperature at a certain rate, second heat treatment of holding at a temperature of 1,030 to 950° C. for 10 to 15 hours, and annealing at a rate of −25° C./hr to −85° C./hr. 6. The method of claim 1 wherein the annealing step includes first annealing step from the second heat treatment temperature to 850° C. at a rate of −25° C./hr to −45° C./hr, and second annealing step from 850° C. to 500° C. at a rate of −25° C./hr to −85° C./hr. 7. The method of claim 1 wherein the step of cooling down to a second heat treatment temperature is at a rate of −7° C./hr to −30° C./hr. 8. The method of claim 1 wherein the synthetic quartz glass to be treated has a hydroxyl concentration of 400 to 600 ppm in a central portion. 9. The method of claim 1 wherein the synthetic quartz glass at the end of heat treatment has a birefringence of up to 2 nm/cm in an effective range subject to irradiation of ArF excimer laser. 10. A method of making a synthetic quartz glass optical member substrate, comprising forming a synthetic quartz glass ingot by the direct process or indirect process; hot working the ingot to make a synthetic quartz glass block; heat treating the synthetic quartz glass block in accordance with the method of claim 1 ; slicing, lapping and polishing the synthetic quartz glass block to form the substrate.

Assignees

Inventors

Classifications

  • Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering · CPC title

  • Thermal after-treatment of glass products not provided for in groups {C03B19/00} , C03B25/00 - C03B31/00 {or C03B37/00}, e.g. crystallisation, eliminating gas inclusions or other impurities; {Hot-pressing vitrified, non-porous, shaped glass products} · CPC title

  • C03B25/02Primary

    in a discontinuous way · CPC title

  • doped with hydroxyl groups · CPC title

  • C03B25/00Primary

    Annealing glass products · CPC title

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What does patent US9487426B2 cover?
A method for heat treating a synthetic quartz glass having a hydroxyl concentration with a maximum/minimum difference (ΔOH) of less than 350 ppm involves the steps of first heat treatment of holding at 1,150-1,060° C. for a time of 0.5-10 hours, cooling down to a second heat treatment temperature at a rate of −7° C./hr to −30° C./hr, second heat treatment of holding at 1,030-950° C. for a time …
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification C03B19/1453. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Nov 08 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).