Conductive polymer composition, coated article, patterning process, and substrate

US9817314B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9817314-B2
Application numberUS-201514842463-A
CountryUS
Kind codeB2
Filing dateSep 1, 2015
Priority dateSep 30, 2014
Publication dateNov 14, 2017
Grant dateNov 14, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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Abstract

Official abstract text for this publication.

The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid, wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, dose not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.

First claim

Opening claim text (preview).

What is claimed is: 1. A conductive polymer composition comprising: (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1); (B) a polyanion; (C) an amino acid; (D) water or solvent; and a nonionic surfactant; wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring, wherein component (C) is selected from the group consisting of the amino acids shown below: 2. The conductive polymer composition according to claim 1 , wherein the component (C) is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 3. The conductive polymer composition according to claim 1 , wherein the component (C) is in an amount of 3 to 10 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 4. The conductive polymer composition according to claim 1 , wherein the nonionic surfactant is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 5. An antistatic film formed using the conductive polymer composition according to claim 1 . 6. A coated article comprising: a body to be processed; and an antistatic film formed on the body to be processed using the conductive polymer composition according to claim 1 . 7. The coated article according to claim 6 , wherein the body to be processed is a substrate having a chemically amplified resist film. 8. The coated article according to claim 7 , wherein the substrate is configured so that a resist pattern is formed on the substrate when the substrate is exposed to pattern irradiation with an electron beam. 9. A patterning process comprising the steps of: providing a substrate having a chemically amplified resist film; forming an antistatic film on a chemically amplified resist film using the conductive polymer composition according to claim 1 ; irradiating in a pattern with electron beam; and developing with an alkaline developer to obtain a resist pattern. 10. A substrate that has a resist pattern obtained by the patterning process according to claim 9 .

Assignees

Inventors

Classifications

  • having only one amino and one carboxyl group bound to the carbon skeleton · CPC title

  • Lysine; Diaminopimelic acid; Threonine; Valine · CPC title

  • G03F7/093Primary

    characterised by antistatic means, e.g. for charge depletion · CPC title

  • Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title

  • Formation of carboxyl groups in compounds containing amino groups, e.g. by oxidation of amino alcohols · CPC title

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What does patent US9817314B2 cover?
The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid, wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group ha…
Who is the assignee on this patent?
Shinetsu Chemical Co
What technology area does this patent fall under?
Primary CPC classification G03F7/093. Mapped technology areas include Physics.
When was this patent published?
Publication date Tue Nov 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).