Method for film formation, and pattern-forming method
US-9958781-B2 · May 1, 2018 · US
US9817314B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9817314-B2 |
| Application number | US-201514842463-A |
| Country | US |
| Kind code | B2 |
| Filing date | Sep 1, 2015 |
| Priority date | Sep 30, 2014 |
| Publication date | Nov 14, 2017 |
| Grant date | Nov 14, 2017 |
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The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) an amino acid, wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, dose not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.
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What is claimed is: 1. A conductive polymer composition comprising: (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1); (B) a polyanion; (C) an amino acid; (D) water or solvent; and a nonionic surfactant; wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring, wherein component (C) is selected from the group consisting of the amino acids shown below: 2. The conductive polymer composition according to claim 1 , wherein the component (C) is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 3. The conductive polymer composition according to claim 1 , wherein the component (C) is in an amount of 3 to 10 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 4. The conductive polymer composition according to claim 1 , wherein the nonionic surfactant is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B). 5. An antistatic film formed using the conductive polymer composition according to claim 1 . 6. A coated article comprising: a body to be processed; and an antistatic film formed on the body to be processed using the conductive polymer composition according to claim 1 . 7. The coated article according to claim 6 , wherein the body to be processed is a substrate having a chemically amplified resist film. 8. The coated article according to claim 7 , wherein the substrate is configured so that a resist pattern is formed on the substrate when the substrate is exposed to pattern irradiation with an electron beam. 9. A patterning process comprising the steps of: providing a substrate having a chemically amplified resist film; forming an antistatic film on a chemically amplified resist film using the conductive polymer composition according to claim 1 ; irradiating in a pattern with electron beam; and developing with an alkaline developer to obtain a resist pattern. 10. A substrate that has a resist pattern obtained by the patterning process according to claim 9 .
having only one amino and one carboxyl group bound to the carbon skeleton · CPC title
Lysine; Diaminopimelic acid; Threonine; Valine · CPC title
characterised by antistatic means, e.g. for charge depletion · CPC title
Macromolecular compounds which are photodegradable, e.g. positive electron resists (G03F7/075 takes precedence; macromolecular quinonediazides G03F7/023) · CPC title
Formation of carboxyl groups in compounds containing amino groups, e.g. by oxidation of amino alcohols · CPC title
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