Roll material for manufacturing electromagnetic induction sealing liner and sealing liner
US-2024424770-A1 · Dec 26, 2024 · US
Laminated structure
US9817313B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9817313-B2 |
| Application number | US-201615086412-A |
| Country | US |
| Kind code | B2 |
| Filing date | Mar 31, 2016 |
| Priority date | Mar 31, 2015 |
| Publication date | Nov 14, 2017 |
| Grant date | Nov 14, 2017 |
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- Title
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- Abstract
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Abstract
Official abstract text for this publication.
A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective layer is a polyester film that has a maximum surface roughness between 1,500 nm and 2,500 nm, and a sheet resistance between 1×108Ω/□ and 1×1012Ω/□. The laminated structure is particularly applicable to the manufacture of a photosensitive device and a circuit of a printed circuit board or a lead frame.
First claim
Opening claim text (preview).
What is claimed is: 1. A laminated structure, comprising a supporting layer, a photosensitive resin layer and a protective layer, wherein the protective layer is a polyester film with surface characteristics that meet the following conditions: 1,500 nm≦maximum surface roughness≦2,500 nm; and 1×10 8 Ω/Υ≦sheet resistance≦1×10 12 Ω/Υ. 2. The laminated structure according to claim 1 , wherein the protective layer has a thickness between about 1 μm and about 100 μm. 3. The laminated structure according to claim 1 , wherein the photosensitive resin layer comprises: (a) a polymeric binder; (b) a photopolymerizable compound containing a double bond; and (c) a photoinitiator. 4. The laminated structure according to claim 1 , wherein the protective layer has a maximum surface roughness between about 1,700 nm and about 2,300 nm. 5. The laminated structure according to claim 1 , wherein the protective layer has a maximum surface roughness of between about 2,000 nm and about 2,300 nm. 6. The laminated structure according to claim 1 , wherein the protective layer has a sheet resistance between 1×10 9 Ω/Υ and 1×10 11 Ω/Υ. 7. The laminated structure according to claim 1 , wherein the protective layer is antistatic.
Assignees
Inventors
Classifications
Flexible substrates, e.g. plastics, organic film · CPC title
Photosensitive compositions · CPC title
comprising polyesters · CPC title
having particular electrical or magnetic properties, e.g. piezoelectric · CPC title
- B32B27/08Primary
of synthetic resin · CPC title
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- What does patent US9817313B2 cover?
- A laminated structure for use as a thy film photoresist, which includes a supporting layer, a photosensitive resin layer and a protective layer. The protective layer is a polyester film that has a maximum surface roughness between 1,500 nm and 2,500 nm, and a sheet resistance between 1×108Ω/□ and 1×1012Ω/□. The laminated structure is particularly applicable to the manufacture of a photosensitiv…
- Who is the assignee on this patent?
- Eternal Mat Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification B32B27/08. Mapped technology areas include Operations & Transport.
- When was this patent published?
- Publication date Tue Nov 14 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).