Conductive polymer composition, coated article, patterning process and substrate

Patent metadata

Field	Value
Publication number	US-9778570-B2
Application number	US-201514979781-A
Country	US
Kind code	B2
Filing date	Dec 28, 2015
Priority date	Jan 30, 2015
Publication date	Oct 3, 2017
Grant date	Oct 3, 2017

Abstract

The present invention provides a conductive polymer composition which contains (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1), (B) a polyanion, and (C) a betaine compound,

wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring. There can be provided a conductive polymer composition that has excellent antistatic performance and applicability, does not adversely affect a resist, and can be suitably used in lithography using electron beam or the like.

First claim

What is claimed is:

1. A conductive polymer composition comprising: (A) a polyaniline-based conductive polymer having a repeating unit represented by the general formula (1); (B) a polyanion; (C) a betaine compound; and (D) water or solvent;

wherein R A1 to R A4 independently represent a hydrogen atom, a halogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally containing a heteroatom; and R A1 and R A2 , or R A3 and R A4 may be bonded to each other to form a ring,
wherein the component (C) is selected from the betaine compounds shown below,

or betaine compounds represented by the general formula (3),

wherein R B1 to R B3 independently represent a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally substituted by a heteroatom or optionally interposed by a heteroatom; R B1 and R B2 , or R B1 , R B2 , and R B3 may be bonded to each other to form a ring with A + in the formula; A + is a heteroatom and represents a monovalent cation; k represents an integer of 2 to 8; L represents a carbon atom or a heteroatom, and may contain the both of them; R B4 and R B5 independently represent a hydrogen atom, or a linear, branched, or cyclic monovalent hydrocarbon group having 1 to 20 carbon atoms and optionally interposed by a heteroatom; and R B4 and R B5 may be bonded to each other to form a ring.

2. The conductive polymer composition according to claim 1 , wherein the component (B) contains a repeating unit represented by the general formula (4),

wherein R 1 represents a hydrogen atom or a methyl group; R 2 represents a single bond, an ester group, or any one of a linear, branched, or cyclic hydrocarbon group having 1 to 12 carbon atoms and optionally contain either or both of an ether group and an ester group; Z represents any one of a phenylene group, a naphthylene group, an ester group; and “a” is 0<a≦1.0.

3. The conductive polymer composition according to claim 1 , wherein the component (C) is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B).

4. The conductive polymer composition according to claim 3 , wherein the component (C) is in an amount of 3 to 10 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B).

5. The conductive polymer composition according to claim 1 , further comprising a nonionic surfactant.

6. The conductive polymer composition according to claim 5 , wherein the nonionic surfactant is in an amount of 1 to 50 parts by mass based on 100 parts by mass of a composite of the component (A) and the component (B).

7. An antistatic film formed from the conductive polymer composition according to claim 1 .

8. A coated article comprising an antistatic film coated on a body to be processed, wherein the antistatic film is formed from the conductive polymer composition according to claim 1 .

9. The coated article according to claim 8 , wherein the body to be processed is a substrate having a chemically amplified resist film.

10. The coated article according to claim 8 , wherein the body to be processed is a substrate for obtaining a resist pattern by pattern irradiation with electron beam.

11. A patterning process comprising the steps of:
forming an antistatic film on a chemically amplified resist film of a substrate having the chemically amplified resist film by using the conductive polymer composition according to claim 1 ;
irradiating in a pattern with electron beam; and
developing with an alkaline developer to obtain a resist pattern.

12. A substrate that has a resist pattern obtained by the patterning process according to claim 11 .

Assignees

• Shinetsu Chemical Co

Inventors

• Nagasawa Takayuki
• Hatakeyama Jun

Classifications

• C07C227/06

  by addition or substitution reactions, without increasing the number of carbon atoms in the carbon skeleton of the acid · CPC title

• C08F220/24

  containing perhaloalkyl radicals · CPC title

• G03C1/89

  Macromolecular substances therefor · CPC title

• C08G73/0266

  Polyanilines or derivatives thereof · CPC title

• G03F7/093 Primary

  characterised by antistatic means, e.g. for charge depletion · CPC title