Method of electroless deposition of aluminum or aluminum alloy, an electroless plating composition, and an article including the same

US9803283B1 · US · B1

Patent metadata
FieldValue
Publication numberUS-9803283-B1
Application numberUS-201414167733-A
CountryUS
Kind codeB1
Filing dateJan 29, 2014
Priority dateOct 18, 2013
Publication dateOct 31, 2017
Grant dateOct 31, 2017

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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  6. CPC / IPC classifications

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  7. Citations and related patents

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Abstract

Official abstract text for this publication.

A method for electroless deposition of aluminum on a substrate includes: activating the substrate; providing an aluminum ionic liquid; adding a reducing agent and an additive to the aluminum ionic liquid to form an electroless plating composition, wherein the additive may include a catalyst, an alloying element, or a combination thereof; and immersing the substrate in the electroless plating composition to have an aluminum layer deposited on the substrate. An article includes the electroless deposited aluminum layer.

First claim

Opening claim text (preview).

What is claimed is: 1. A method for electroless deposition of aluminum on a substrate, the method comprising: activating the substrate; providing an aluminum ionic liquid; adding a reducing agent and an additive to the aluminum ionic liquid to form an electroless plating composition, wherein the additive comprises a catalyst selected from the group consisting of TiCl 2 , TiCl 3 , TiCl 4 , ZrCl 4 , VCl 3 , NbCl 5 , CeCl 3 and combinations thereof; and immersing the activated substrate in the electroless plating composition. 2. The method of claim 1 , wherein the reducing agent is selected from the group consisting of alkali metal hydrides, alkaline earth metal hydrides, alanate salts of alkali metal, alanate salts of alkaline earth metal, borohydride salts, hydrided alkyl-metal compounds, and a combination thereof. 3. The method of claim 2 , wherein the reducing agent is lithium hydride, di-isobutyl aluminum hydride, NaAlH 4 , LiBH 4 or NaBH 4 . 4. The method of claim 1 , wherein the aluminum ionic liquid comprises 1-ethyl-3-methylimidazolium chloride, N-alkylpyridinium halides, N-alkylimidazolium halides, N,N′-alkylimidazolium halides, N-alkylpyrazolium halides, N,N′-alkylpyrazolium halides, bis(trifluoromethylsulfonyl) amide, trispentafluoroethyl-trifluorophosphate, trifluoroacetate, trifluoromethylsulfonate, dicyanoamide, tricyanomethide, tetracyanoborate, tetraphenylborate, tris(trifluoromethylsulfonyl) methide, thiocyanate, or a combination thereof. 5. The method of claim 1 , wherein the activating of the substrate comprises: degreasing the substrate; etching the substrate; and creating catalytic metal sites on the substrate for deposition. 6. The method of claim 5 , wherein the creating catalytic metal sites on the substrate for deposition comprises depositing iron, palladium, silver, gold, ruthenium, rhodium, osmium, iridium, platinum or combinations thereof on the substrate. 7. The method of claim 1 , wherein the substrate comprises glass, metal, metal oxide, ceramic, organic material, or polymer. 8. The method of claim 1 , wherein the aluminum is uniformly deposited as a layer on the substrate. 9. The method of claim 1 , further comprising adding particulates in the electroless plating composition prior to the immersing the substrate in the electroless plating composition, and the aluminum is deposited as a layer on the substrate with the particulates. 10. The method of claim 1 , wherein the additive further comprises an alloying element. 11. The method of claim 1 , wherein the catalyst is included at about 2 ppm to about 1 wt % based on a total weight of the electroless plating composition. 12. The method of claim 1 , wherein the catalyst is selected from the group consisting of TiCl 2 , TiCl 4 , ZrCl 4 , VCl 3 , NbCl 5 , CeCl 3 and combinations thereof.

Assignees

Inventors

Classifications

  • with ionic liquid · CPC title

  • with use of organic or inorganic compounds other than metals, first · CPC title

  • Coating with metals · CPC title

  • with use of organic or inorganic compounds other than metals, first · CPC title

  • with use of organic or inorganic compounds other than metals, first · CPC title

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What does patent US9803283B1 cover?
A method for electroless deposition of aluminum on a substrate includes: activating the substrate; providing an aluminum ionic liquid; adding a reducing agent and an additive to the aluminum ionic liquid to form an electroless plating composition, wherein the additive may include a catalyst, an alloying element, or a combination thereof; and immersing the substrate in the electroless plating co…
Who is the assignee on this patent?
Hrl Lab Llc
What technology area does this patent fall under?
Primary CPC classification C23C18/1687. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Oct 31 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).