Calibration standard with pre-determined features

Patent metadata

Field	Value
Publication number	US-9797924-B2
Application number	US-201314783403-A
Country	US
Kind code	B2
Filing date	Apr 17, 2013
Priority date	Apr 17, 2013
Publication date	Oct 24, 2017
Grant date	Oct 24, 2017

Abstract

Provided herein in an apparatus, including a substrate; a functional layer, wherein the functional layer has a composition characteristic of a workpiece of an analytical apparatus; and pre-determined features configured to calibrate the analytical apparatus. Also provided herein is an apparatus, including a functional layer overlying a substrate; and pre-determined features for calibration of an analytical apparatus configured to measure the surface of a workpiece, wherein the functional layer has a composition similar to the workpiece. Also provided herein is a method, including providing a lithographic calibration standard having a functional layer to an analytical apparatus, wherein the functional layer has a composition characteristic of a workpiece of the analytical apparatus; providing calibration standard specifications to a computer interfaced with the analytical apparatus; and calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

First claim

What is claimed is:

1. An apparatus, comprising:
a substrate;
a functional layer, wherein the functional layer comprises a composition characteristic of a workpiece of an analytical apparatus; and
a feature layer including pre-determined features configured to calibrate the analytical apparatus.

2. The apparatus of claim 1 , wherein the apparatus comprises characteristics of a lithographic fabrication process.

3. The apparatus of claim 1 , wherein the functional layer overlies the pre-determined features.

4. The apparatus of claim 1 , wherein the functional layer comprises at least one layer, and wherein the at least one layer comprises a composition different than the substrate.

5. The apparatus of claim 1 , wherein the functional layer comprises a plurality of layers.

6. The apparatus of claim 1 , wherein the apparatus further comprises a metal layer directly overlying the functional layer.

7. The apparatus of claim 1 , wherein the apparatus further comprises a resist layer.

8. The apparatus of claim 1 , wherein the apparatus further comprises a protective overcoat.

9. The apparatus of claim 8 , wherein the protective overcoat comprises carbon, colloid-occluded carbon, diamond-like carbon, a metal, or a ceramic material.

10. The apparatus of claim 1 , wherein the pre-determined features are arranged in annular regions by height.

11. An apparatus, comprising:
a functional layer overlying a substrate, wherein the functional layer comprises a composition similar to a workpiece; and
a feature layer including pre-determined features for calibration of an analytical apparatus configured to measure the surface of the workpiece, wherein the pre-determined features of the feature layer correspond to potential defects in the workpiece.

12. The apparatus of claim 11 , wherein the functional layer comprises at least one layer, and wherein the at least one layer comprises a composition different than the substrate.

13. The apparatus of claim 11 , wherein the pre-determined features are arranged in annular regions by height.

14. A method, comprising:
providing a lithographic calibration standard comprising a functional layer and a feature layer to an analytical apparatus,
wherein the functional layer comprises a composition characteristic of a workpiece of the analytical apparatus;

providing calibration standard specifications to a computer interfaced with the analytical apparatus; and
calibrating the analytical apparatus in accordance with calibration standard readings and the calibration standard specifications.

15. The method of claim 14 , wherein the feature layer of the calibration standard comprises pre-determined features for calibration of the apparatus.

16. The method of claim 15 , wherein the calibration standard specifications are in accordance with the pre-determined features.

17. The method of claim 14 , wherein the means for calibrating the apparatus comprises
reading the calibration standard with the analytical apparatus,
providing calibration standard readings to the computer,
determining differences between the calibration standard readings and the calibration standard specifications, and
adjusting the analytical apparatus to minimize differences between the calibration standard readings and the calibration standard specifications.

18. The method of claim 17 , wherein determining differences between the calibration standard readings and the calibration standard specifications further comprises filtering out calibration standard readings arising from contamination on a surface of the calibration standard.

19. The method of claim 14 , wherein the analytical apparatus is an optical surface analyzer, magnetic read-write head space analyzer, a scanning probe microscope, an electron microscope, an X-ray scatterometer, or an X-ray diffractometer.

20. The method of claim 14 , wherein the calibration standard comprises the apparatus of any one of claims 1 - 10 .

Assignees

• Seagate Technology Llc

Inventors

• Gauzner Gennady
• Yu Zhaoning
• Kurataka Nobuo
• Kuo David S
• Lee Kim Y
• Hsu Yautzong
• Wang Hong Ying

Classifications

• G01Q40/02 Primary

  Calibration standards and methods of fabrication thereof · CPC title

• G03F7/0002

  Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping · CPC title

• H01J2237/2826

  Calibration · CPC title

• H01J37/261

  Details · CPC title

• G01Q40/00

  Calibration, e.g. of probes · CPC title