Method and apparatus to compensate for deflection artifacts in an atomic force microscope

Patent metadata

Field	Value
Publication number	US-9739799-B2
Application number	US-201414193138-A
Country	US
Kind code	B2
Filing date	Feb 28, 2014
Priority date	Feb 28, 2014
Publication date	Aug 22, 2017
Grant date	Aug 22, 2017

Abstract

A method of compensating for an artifact in data collected using a standard atomic force microscope (AFM) operating in an oscillating mode. The artifact is caused by deflection of the probe not related to actual probe-sample interaction and the method includes compensating for thermal induced bending of the probe of the AFM by measuring a DC component of the measured deflection. The DC component of deflection is identified by calibrating the optical deflection detection apparatus and monitoring movement of the mean deflection, thereby allowing the preferred embodiments to minimize the adverse effect due to the artifact. Notably, plotting the DC deflection profile yields a corresponding temperature profile of the sample.

First claim

The invention claimed is:

1. A method of compensating for a thermal deflection artifact of a probe of a scanning probe microscope (SPM) operating in an oscillating mode, the method comprising:
generating relative oscillating motion between a probe and a sample;
providing relative scanning motion between the probe and the sample;
detecting motion of the probe as the probe and the sample interact during the providing step;
controlling probe-sample proximity based on the detected motion, the controlling step generating SPM scanner measured height;
determining a DC component of a cantilever shape change during the scanning step;
converting the DC component to a displacement; and
adding the displacement with the SPM scanner measured height at each scan location to generate an SPM image in which the thermal deflection artifact is compensated.

2. The method of claim 1 , further comprising calibrating a detector used during the detecting step.

3. The method of claim 2 , wherein the calibrating step includes generating a force-distance curve on a known sample so as to generate a conversion factor (nm/V).

4. The method of claim 1 , wherein the displacement is at least one of vertical displacement and lateral displacement.

5. The method of claim 1 , wherein the controlling step includes using an intermittent contact mode of SPM operation.

6. The method of claim 5 , wherein the intermittent contact mode is at least one of tapping mode, peak force tapping (PFT) mode and torsional resonance (TR) mode.

7. The method of claim 1 , further comprising generating a temperature profile of the sample using the displacement.

8. The method of claim 7 , further comprising plotting the displacement at each scan location to generate the temperature profile.

9. The method of claim 7 , wherein the generating a thermal profile step includes calibrating the DC cantilever deflection to a known temperature change.

10. A method of generating a temperature profile of a sample, the method comprising:
generating relative oscillating motion between a probe and a sample;
providing relative scanning motion between the probe and the sample;
detecting motion of the probe as the probe and the sample interact during the providing step;
controlling probe-sample proximity based on the detected motion so as to generate AFM scanner measured height;
determining a DC component of cantilever shape change; and
wherein the DC component of cantilever shape change indicative of a temperature profile of the sample surface.

11. The method of claim 10 , wherein the controlling step includes using an intermittent contact mode of SPM operation.

12. The method of claim 11 , wherein the using step includes monitoring at least one of an amplitude of the relative oscillation near resonance and a peak force when the relative oscillation is below resonance.

13. The method of claim 12 , wherein the intermittent contact mode is at least one of tapping mode, peak force tapping (PFT) mode and torsional resonance (TR) mode.

14. The method of claim 10 , further comprising calibrating a detector used during the detecting step.

15. The method of claim 14 , wherein the calibrating step includes generating a force-distance curve on a known sample so as to generate a conversion factor (nm/V).

16. The method of claim 10 , wherein the displacement is at least one of vertical displacement and lateral displacement.

17. The method of claim 10 , wherein the converting step includes calibrating the DC cantilever deflection to a known temperature change.

Assignees

• Bruker Nano Inc

Inventors

• Su Chanmin
• Hu Shuiqing

Classifications

• G01Q40/00 Primary

  Calibration, e.g. of probes · CPC title

• G01Q30/06

  for error compensation · CPC title

• G01Q60/34

  Tapping mode · CPC title

• G01Q60/58

  SThM [Scanning Thermal Microscopy] or apparatus therefor, e.g. SThM probes · CPC title