Method for producing a SiC single crystal in the presence of a magnetic field which is applied to a solution

Patent metadata

Field	Value
Publication number	US-9708734-B2
Application number	US-201314648027-A
Country	US
Kind code	B2
Filing date	Nov 11, 2013
Priority date	Dec 27, 2012
Publication date	Jul 18, 2017
Grant date	Jul 18, 2017

Abstract

The purpose of the present invention is to produce a high-quality SiC single crystal with good reproducibility while avoiding the fluctuations in the solution-contacting position of a seed crystal among production operations. A method for producing a SiC single crystal by bringing a SiC seed crystal supported by a supporting bar into contact with a solution that has been heated by high-frequency induction to thereby grow the SiC single crystal, wherein the supporting bar is born down while applying a magnetic field to the solution to thereby bring the SiC seed crystal into contact with the solution, and subsequently the application of the magnetic field is halted to grow the SiC single crystal.

First claim

The invention claimed is:

1. A method of production of a SiC single crystal which brings a SiC seed crystal which is supported by a support rod into contact with a solution that has been heated by induction to grow a SiC single crystal, said method of production of a SiC single crystal making said support rod descend to make the SiC seed crystal contact said solution in the presence of a magnetic field which is applied to said solution, then stopping application of said magnetic field while growing the SiC single crystal.

2. The method of production according to claim 1 wherein said magnetic field is applied for 0.5 minute to 10 minutes until making the SiC seed crystal contact said solution.

3. The method of production according to claim 1 wherein said magnetic field stops being applied within 1 minute after said contact.

4. The method of production according to claim 1 wherein control to stop application of said magnetic field is performed based on an electric signal which is generated by contact of said solution and SiC seed crystal.

5. The method of production according to claim 1 wherein said magnetic field is directed downward from a solution surface toward a bottom part of a crucible.

6. The method of production according to claim 1 wherein said magnetic field has a strength of 0.1 T or more.

7. The method of production according to claim 1 wherein said SiC single crystal is grown after bring the SiC seed crystal into contact with said solution, then stopping the descent of the support rod while lifting up the support rod.

8. The method of production according to claim 1 wherein said solution has a temperature of within 1800 to 2100° C. in range.

Assignees

• Daikoku Hironori
• Sakamoto Hidemitsu
• Kado Motohisa
• Kusunoki Kazuhiko
• Toyota Motor Co Ltd

Inventors

• Daikoku Hironori
• Sakamoto Hidemitsu
• Kado Motohisa
• Kusunoki Kazuhiko

Classifications

• C30B19/068

  Substrate holders · CPC title

• C30B17/00

  Single-crystal growth onto a seed which remains in the melt during growth, e.g. Nacken-Kyropoulos method (C30B15/00 takes precedence) · CPC title

• C30B29/36

  Carbides · CPC title

• C30B30/04 Primary

  using magnetic fields · CPC title

• C30B19/067

  Boots or containers · CPC title