Method of and apparatus for supply and recovery of target material

Patent metadata

Field	Value
Publication number	US-9699876-B2
Application number	US-201414151600-A
Country	US
Kind code	B2
Filing date	Jan 9, 2014
Priority date	Mar 14, 2013
Publication date	Jul 4, 2017
Grant date	Jul 4, 2017

Abstract

An EUV light source target material handling system is disclosed which may comprise a droplet generator having a target material reservoir in which the target material may be replenished while a nozzle portion of the droplet generator is maintained at temperature. Also disclosed is a system for selectively draining spent target material.

First claim

What is claimed is:

1. An EUV light source target material handling system comprising a target material delivery system adapted to deliver target material to an irradiation region of an EUV light source and a target material supply system adapted to supply target material to said target material delivery system,
said target material delivery system comprising
a target material reservoir;
a nozzle in fluid communication with said target material reservoir; and a heater arranged to be capable of maintaining said nozzle above a temperature sufficient to keep target material in the nozzle in liquid form;

said target material supply system comprising a repository for holding target material;

said target material handling system further comprising a target material transfer system interposed between said target material reservoir and said repository and adapted to selectively establish a pathway for transfer of said target material from said repository to said target material reservoir, said target material transfer system further including a flexible line between the repository and the target material reservoir to permit the target material delivery system to be moved independently of the repository.

2. The system of claim 1 wherein said target material transfer system comprises a valve to selectively establish a pathway for transfer of said target material from said repository to said target material reservoir and to selectively isolate the repository from the droplet generator plasma source material reservoir.

3. The system of claim 1 wherein the repository is adapted to receive a quantity of target material in solid form, and wherein the target material handling system includes a heater to cause solid target material in said repository to become liquid target material.

4. The system of claim 1 wherein said target material transfer system further includes a heat actuated valve between the repository and the target material reservoir.

5. An EUV light source target material handling system comprising a target material delivery system adapted to deliver target material to an irradiation region of an EUV light source and a target material supply system adapted to supply target material to said target material delivery system,
said target material delivery system comprising
a target material reservoir;
a nozzle in fluid communication with said target material reservoir; and a heater arranged to be capable of maintaining said nozzle above a temperature sufficient to keep target material in the nozzle in liquid form;

said target material supply system comprising a first repository and a second repository for holding target material;

said target material handling system further comprising a target material transfer system interposed between said target material reservoir and said first repository and said second repository adapted to selectively establish a pathway for transfer of said target material from said first repository and said second repository to said target material reservoir.

6. The system of claim 5 wherein said target material transfer system comprises a valve to selectively establish a pathway for transfer of said target material from said first repository to said target material reservoir and to selectively isolate the first repository from the target material reservoir.

7. The system of claim 5 wherein the first repository is adapted to receive a quantity of target material in solid form, and wherein the target material handling system includes a heater to cause solid target material in said first repository to become liquid target material.

8. The system of claim 5 wherein the second repository is adapted to receive a quantity of target material in solid form, and wherein the target material handling system includes a heater to cause solid target material in said second repository to become liquid target material.

9. The system of claim 5 wherein the first repository and second repository are respectively adapted to receive a quantity of target material in solid form and wherein the target material handling system includes a first heater to cause solid target material in said first repository to become liquid target material and a second heater to cause solid target material in said second repository to become liquid target material.

10. The system of claim 9 wherein the target material handling system is adapted to have a first state in which said first repository is in fluid communication with said target material reservoir and said second repository is not in fluid communication with said target material reservoir, and a second state in which said first repository is not in fluid communication with said target material reservoir and said second repository is in fluid communication with said target material reservoir.

11. The system of claim 5 wherein said target material transfer system further includes heat actuated valve between the first repository and the target material reservoir.

12. The system of claim 5 wherein said target material transfer system further includes heat actuated valve between the second repository and the droplet generator plasma source material reservoir.

13. The system of claim 5 wherein said target material transfer system further includes a flexible line between the first repository and the reservoir to permit the target material delivery system to be moved independently of the first repository.

14. The system of claim 5 wherein said target material transfer system further includes a flexible line between the second repository and the reservoir to permit the target material delivery system to be moved independently of the second repository.

15. An EUV light source target material handling system comprising a target material delivery system adapted to deliver target material to an irradiation region of an EUV light source and a target material supply system adapted to supply target material to said target material delivery system,
said target material delivery system comprising
a target material reservoir;
a nozzle in fluid communication with said target material reservoir; and a heater arranged to be capable of maintaining said nozzle above a temperature sufficient to keep target material in the nozzle in liquid form;

said target material supply system comprising a repository for holding target material in the form of pellets; the repository including a dispensing mechanism for dispensing the pellets one at a time into the pathway, the dispensing mechanism comprising an element with structure defining a plurality of apertures each dimensioned to receive one of said pellets and a mechanism mechanically coupled to said element so as to sequentially move each of said apertures from a first position wherein one of said apertures receives a pellet from said repository and a second position wherein said pellet is released from the aperture into said pathway;
said target material handling system further comprising a target material transfer system interposed between said target material reservoir and said repository and adapted to selectively establish a pathway for transfer of said pellets from said repository to said target material reservoir.

16. The system of claim 15 wherein said target material transfer system comprises a valve to selectively establish a pathway for transfer of said target material from said repository to said target material reservoir and to selectively isolate the repository from the droplet generator plasma source material reservoir.

17. An EUV light source target material handling system co

Assignees

• Asml Netherlands Bv
• Asml Netherlands Bv

Inventors

• Vaschenko Georgiy
• Baumgart Peter
• Gacutan Jeffrey
• Algots Martin
• Syrpis Theodosios
• Rajyaguru Chirag
• Seshagiri Sanjeev

Classifications

• Y10T137/6416

  With heating or cooling of the system · CPC title

• H05G2/0025

  Systems for collecting the plasma generating material after the plasma generation · CPC title

• H05G2/002 Primary

  Supply of the plasma generating material · CPC title

• H05G2/005

  Electricity · mapped topic

• H05G2/008

  involving an energy-carrying beam in the process of plasma generation · CPC title