Method of manufacturing EUV photo masks
US-12085843-B2 · Sep 10, 2024 · US
Collector in an Extreme Ultraviolet Lithography System with Optimal Air Curtain Protection
US2016306282A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016306282-A1 |
| Application number | US-201615194118-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 27, 2016 |
| Priority date | Mar 13, 2014 |
| Publication date | Oct 20, 2016 |
| Grant date | — |
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Abstract
Official abstract text for this publication.
The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward and outward entrances are configured and operable to form a gas curtain on the coating surface of the collector.
First claim
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What is claimed is: 1 . An extreme ultraviolet (EUV) lithography system, comprising: a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module, wherein the gas pipeline includes inward and outward entrances into the collector, wherein the inward and outward entrances are configured and operable to form a gas curtain on the coating surface of…
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Electricity · mapped topic
Electricity · mapped topic
- G03F7/70033Primary
Physics · mapped topic
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- What does patent US2016306282A1 cover?
- The present disclosure provides an extreme ultraviolet (EUV) lithography system. The EUV lithography system includes a collector having a coating surface designed to collect and reflect EUV radiation; a gas supply module; and a gas pipeline integrated with the collector and connected to the gas supply module. The gas pipeline includes inward and outward entrances into the collector. The inward …
- Who is the assignee on this patent?
- Taiwan Semiconductor Mfg Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70033. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Thu Oct 20 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).