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Method for euv power improvement with fuel droplet trajectory stabilization
US2016366756A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2016366756-A1 |
| Application number | US-201514736322-A |
| Country | US |
| Kind code | A1 |
| Filing date | Jun 11, 2015 |
| Priority date | Jun 11, 2015 |
| Publication date | Dec 15, 2016 |
| Grant date | — |
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Abstract
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The present disclosure relates to an extreme ultraviolet (EUV) radiation source that generates charged tin droplets having a trajectory controlled by an electromagnetic field, and an associated method. In some embodiments, the EUV radiation source has a laser that generates a laser beam. A charged fuel droplet generator provides a plurality of charged fuel droplets having a net electrical charge to an EUV source vessel. An electromagnetic field generator generates an electric field and/or a magnetic field. The net electrical charge of the charged fuel droplets causes the electric or magnetic field to generate a force on the charged fuel droplets that controls a trajectory of the charged fuel droplets to intersect the laser beam. By using the electric or magnetic field to control a trajectory of the charged fuel droplets, the EUV system is able to avoid focus issues between the laser beam and the charged fuel droplets.
First claim
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1 . An extreme ultraviolet (EUV) radiation source, comprising: a charged fuel droplet generator configured to provide a plurality of charged fuel droplets having a net positive or negative electrical charge to an EUV source vessel; a laser configured to generate a laser beam having a sufficient energy to ignite a plasma from the charged fuel droplets, wherein the plasma emits extreme ultraviolet radiation; and an electromagnetic field generator configured to generate an electric field or a…
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- What does patent US2016366756A1 cover?
- The present disclosure relates to an extreme ultraviolet (EUV) radiation source that generates charged tin droplets having a trajectory controlled by an electromagnetic field, and an associated method. In some embodiments, the EUV radiation source has a laser that generates a laser beam. A charged fuel droplet generator provides a plurality of charged fuel droplets having a net electrical charg…
- Who is the assignee on this patent?
- Taiwan Semiconductor Mfg Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification H05G2/002. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Dec 15 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).