Electrofill vacuum plating cell

Patent metadata

Field	Value
Publication number	US-9677188-B2
Application number	US-201314102239-A
Country	US
Kind code	B2
Filing date	Dec 10, 2013
Priority date	Jun 17, 2009
Publication date	Jun 13, 2017
Grant date	Jun 13, 2017

Abstract

The disclosed embodiments relate to methods and apparatus for immersing a substrate in electrolyte in an electroplating cell under sub-atmospheric conditions to reduce or eliminate the formation/trapping of bubbles as the substrate is immersed. Various electrolyte recirculation loops are disclosed to provide electrolyte to the plating cell. The recirculation loops may include pumps, degassers, sensors, valves, etc. The disclosed embodiments allow a substrate to be immersed quickly, greatly reducing the issues related to bubble formation and uneven plating times during electroplating.

First claim

What is claimed is:

1. A method of electroplating metal onto a substrate, comprising:
flowing an electrolyte through a plating recirculation loop comprising an electrolyte reservoir, a pump, an electroplating cell, and a degasser that degasses the electrolyte prior to its introduction to the electroplating cell;
injecting a gas into the electrolyte after the electrolyte is degassed and before the electrolyte is introduced to the electroplating cell;
immersing the substrate in the electrolyte in the electroplating cell, wherein the pressure in the electroplating cell during immersion is about 100 Torr or less;
electroplating material onto the substrate; and
removing the substrate from the electrolyte.

2. The method of claim 1 , wherein the pressure in the electroplating cell during immersion is at least about 20 Torr.

3. The method of claim 1 , wherein the step of immersing the substrate in the electrolyte occurs over a period of about 225 ms or less, and wherein the substrate has a diameter of about 150 mm or greater.

4. The method of claim 3 , wherein the step of immersing the substrate in the electrolyte occurs over a period of about 50 ms or less, and wherein the substrate has a diameter of about 150 mm or greater.

5. The method of claim 1 , wherein the step of immersing the substrate in the electrolyte occurs over a period having a first duration, and a step of electroplating material to fill a feature on the substrate during the step of electroplating material onto the substrate occurs over a period having a second duration, and wherein the first duration is about 10% or less of the second duration.

6. The method of claim 5 , wherein the feature is a smallest feature on the substrate, as measured by volume.

7. The method of claim 5 , wherein the feature is a median-sized feature on the substrate, as measured by volume.

8. The method of claim 1 , wherein the substrate is immersed at an angle, and wherein the substrate swings to a horizontal orientation at a swing speed between about 0.25-10 degrees/second.

9. The method of claim 1 , wherein the pressure in the electroplating cell remains at or below about 100 Torr during at least the first about 10 ms of the electroplating.

10. The method of claim 9 , wherein the pressure in the electroplating cell remains at or below about 100 Torr until after the electroplating ceases.

11. The method of claim 1 , further comprising inserting the substrate into a loadlock and reducing pressure in the loadlock to below about 100 Torr.

12. The method of claim 1 , wherein the gas is oxygen and the oxygen is injected to an electrolyte concentration of about 10 ppm or less.

13. The method of claim 12 , wherein the oxygen is injected to an electrolyte concentration of about 1 ppm or less.

14. The method of claim 1 , further comprising flowing the electrolyte through a gas control recirculation loop comprising the electrolyte reservoir and a dissolved gas sensor, wherein a dissolved gas controller controls a gas injection unit based on input from the dissolved gas sensor in order to regulate a concentration of dissolved gas in the electrolyte.

15. The method of claim 14 , wherein the plating recirculation loop is separate from the gas control recirculation loop.

16. The method of claim 1 , wherein during the electroplating, the electrolyte bypasses the electrolyte reservoir of the plating recirculation loop by passing through a bypass conduit.

17. The method of claim 1 , further comprising flowing the electrolyte through an atmospheric recirculation loop when the electroplating is not occurring, wherein the atmospheric recirculation loop comprises the electrolyte reservoir, an atmospheric electrolyte reservoir, and an atmospheric loop pump.

18. The method of claim 1 , further comprising degassing the electrolyte in a degassing electrolyte reservoir, and flowing the electrolyte through a degassing recirculation loop and an atmospheric recirculation loop, wherein the degassing recirculation loop comprises the electrolyte reservoir, a degassing loop pump, and a degassing electrolyte reservoir, and wherein the atmospheric recirculation loop comprises the degassing electrolyte reservoir, an atmospheric loop pump, and an atmospheric electrolyte reservoir.

19. A method of electroplating metal onto a substrate, comprising:
flowing an electrolyte through a plating recirculation loop comprising an electrolyte reservoir, a pump, an electroplating cell, and a degasser that degasses the electrolyte prior to its introduction to the electroplating cell;
immersing the substrate in the electrolyte in the electroplating cell, wherein the pressure in the electroplating cell during immersion is about 100 Torr or less;
electroplating material onto the substrate, wherein during the electroplating, the electrolyte bypasses the electrolyte reservoir of the plating recirculation loop by passing through a bypass conduit; and
removing the substrate from the electrolyte.

20. An apparatus for electroplating metal onto a substrate, comprising:
an electroplating cell configured to withstand pressure below about 100 Torr, comprising a substrate holder, an electrolyte containment vessel, and a substrate positioning system capable of controlling an orientation of a substrate as it is immersed in the electrolyte containment vessel;
a plating recirculation loop comprising an electrolyte reservoir, a pump, a degasser, and the electroplating cell, wherein the degasser is positioned after the electrolyte reservoir and before the electroplating cell in the plating recirculation loop;
a gas injection unit; and
a plating controller having instructions for:
flowing an electrolyte through the plating recirculation loop,
injecting gas from the gas injection unit into the electrolyte after the electrolyte is degassed and before the electrolyte is introduced to the electroplating cell,
immersing the substrate in the electrolyte in the electrolyte containment vessel while maintaining a pressure of about 100 Torr or less in the electrolyte containment vessel,
electroplating material onto the substrate, and
removing the substrate from the electrolyte.

21. The apparatus of claim 20 , wherein the substrate positioning system is capable of controlling translation, tilt and rotation of the substrate.

22. The apparatus of claim 20 , further comprising a dissolved gas sensor.

23. The apparatus of claim 22 , further comprising a dissolved gas controller, wherein the dissolved gas controller controls the gas injection unit based on measurements from the dissolved gas sensor.

24. The apparatus of claim 20 , further comprising a bypass conduit, wherein the plating controller is configured to flow electrolyte through the bypass conduit to thereby bypass the electrolyte reservoir during electroplating.

25. The apparatus of claim 20 , further comprising an atmospheric recirculation loop comprising the electrolyte reservoir, an atmospheric loop pump, and an atmospheric electrolyte reservoir, wherein the plating controller is configured to prevent the atmospheric recirculation loop from circulating during electroplating.

26. The apparatus of claim 20 , further comprising a degassing electrolyte recirculation loop and an atmospheric recirculation loop, wherein the degassing electrolyte recirculation loop comprises the electrolyte reservoir, a pump, and a degassing electrolyte reservoir, and the atmospheric recircula

Assignees

• Novellus Systems Inc

Inventors

• Stowell R Marshall
• Feng Jingbin
• Porter David W

Classifications

• C25D7/123

  Semiconductors first coated with a seed layer or a conductive layer · CPC title

• C25D17/001

  Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells · CPC title

• C25D21/04

  Removal of gases or vapours {; Gas or pressure control} · CPC title

• C25D5/02

  Electroplating of selected surface areas · CPC title

• C25D21/12

  Process control or regulation (controlling or regulating in general G05) · CPC title