Handle substrates of composite substrates for semiconductors, and composite substrates for semiconductors

US9673282B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-9673282-B2
Application numberUS-201514835960-A
CountryUS
Kind codeB2
Filing dateAug 26, 2015
Priority dateFeb 12, 2014
Publication dateJun 6, 2017
Grant dateJun 6, 2017

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Abstract

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A handle substrate of a composite substrate for a semiconductor is provided. The handle substrate is composed of polycrystalline alumina. The handle substrate includes an outer peripheral edge part with an average grain size of 20 to 55 μm and a central part with an average grain size of 10 to 50 μm. The average grain size of the outer peripheral edge part is 1.1 times or more and 3.0 times or less of that of the central part of the handle substrate.

First claim

Opening claim text (preview).

The invention claimed is: 1. A composite substrate for a semiconductor: said composite substrate comprising a handle substrate and a donor substrate, said handle substrate comprising polycrystalline alumina; wherein said handle substrate comprises an outer peripheral edge part and a central part, wherein said outer peripheral edge part has an average grain size of 20 to 55 μm; and wherein said central part has an average grain size of 10 to 50 μm; wherein said average grain size of said outer peripheral edge part of said handle substrate is 1.1 times or more and 3.0 times or less of said average grain size of said central part of said handle substrate, and wherein said handle substrate further comprises a single bonding face comprising a central face part on said central part and an outer peripheral edge face part on said outer peripheral edge part, and wherein said central face part and said outer peripheral edge face part of said bonding face of said handle substrate are bonded to said donor substrate. 2. The composite substrate of claim 1 , wherein said donor substrate comprises single crystalline silicon.

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What does patent US9673282B2 cover?
A handle substrate of a composite substrate for a semiconductor is provided. The handle substrate is composed of polycrystalline alumina. The handle substrate includes an outer peripheral edge part with an average grain size of 20 to 55 μm and a central part with an average grain size of 10 to 50 μm. The average grain size of the outer peripheral edge part is 1.1 times or more and 3.0 times or …
Who is the assignee on this patent?
Ngk Insulators Ltd
What technology area does this patent fall under?
Primary CPC classification H10P90/1914. Mapped technology areas include Electricity.
When was this patent published?
Publication date Tue Jun 06 2017 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).