Target material supply apparatus for an extreme ultraviolet light source

Patent metadata

Field	Value
Publication number	US-9632418-B2
Application number	US-201615168431-A
Country	US
Kind code	B2
Filing date	May 31, 2016
Priority date	Oct 16, 2012
Publication date	Apr 25, 2017
Grant date	Apr 25, 2017

Abstract

A target material supply apparatus for an extreme ultraviolet (EUV) light source includes a tube that includes a first end, a second end, and a sidewall defined between the first and second ends. At least a portion of an outer surface of the tube includes an electrically insulating material, the first end receives a pressurized target material, and the second end defines an orifice through which the pressurized target material passes to produce a stream of target material droplets. The target material supply apparatus also includes an electrically conductive coating on the outer surface of the tube. The coating is configured to electrically connect the outer surface of the tube to ground to thereby reduce surface charge on the outer surface.

First claim

What is claimed is:

1. A method for producing a stream of target material droplets in an extreme ultraviolet (EUV) light source, the method comprising:
electrically connecting a metallic coating on an exterior surface of an insulating tube to ground;
applying pressure to a target material held in a reservoir that is in fluid communication with the insulating tube;
receiving the pressurized target material through a first end of the tube; and
passing the target material through an orifice defined by a second end of the tube to produce the stream of droplets, wherein
the droplets travel in a vacuum chamber towards a target region configured to receive a laser beam sufficient to convert a target material droplet into a plasma, and a first droplet in the stream and a second droplet in the stream pass through substantially the same spatial location in the target region at different times.

2. The method of claim 1 , wherein the pressure is at least 4000 psi.

3. The method of claim 1 , wherein the pressure is at least 2000 psi.

4. The method of claim 1 , wherein the pressure is between 2000 psi and 10000 psi.

5. The method of claim 1 , wherein electrically connecting the metallic coating to ground comprises connecting an electrically conductive element to the metallic coating, and connecting the electrically conductive element to a grounded portion of the EUV light source.

6. The method of claim 1 , wherein the metallic coating on the exterior surface of the insulating tube is on the second end of the tube that defines the orifice.

7. The method of claim 1 , wherein
the insulating tube is received in a conductive fitting at the first end, the conductive fitting being grounded,
the metallic coating on the exterior surface of the insulating tube is on the second end of the tube and extends to a portion of the exterior surface of the insulating tube that is received in the conductive fitting such that the metallic coating is connected to ground through a direct connection between the metallic coating and the conductive fitting.

8. A method for producing a stream of target material droplets in an extreme ultraviolet (EUV) light source, the method comprising:
electrically connecting a metallic coating on an exterior surface of an insulating structure to an electrical potential, the insulating structure comprising a first end, a second end, and a sidewall between the first end and the second end, the sidewall defining an interior space;
applying pressure to a target material held in a reservoir that is in fluid communication with the interior space of the insulating structure;
receiving the pressurized target material through the first end of the insulating structure; and
passing the target material through an orifice defined by the second end of the insulating structure to produce the stream of target material droplets, wherein
the target material droplets travel in a vacuum chamber toward a target region configured to receive a laser beam sufficient to convert a target material droplet into a plasma, and
a plurality of the target material droplets in the stream pass through substantially the same spatial location in the target region, each droplet in the plurality of target material droplets passing through the target region at a different time.

9. The method of claim 8 , wherein each target material droplet in the plurality of target material droplets passes through a spatial location in the target region, the standard deviation of the spatial locations being 10 microns (μm) or less.

10. The method of claim 8 , wherein each target material droplet in the plurality of target material droplets passes through a spatial location in the target region, the standard deviation the spatial locations being 5 microns (μm) or less.

11. The method of claim 8 , wherein the metallic coating on the exterior surface of the insulating structure is on the second end of the insulating structure that defines the orifice.

12. The method of claim 8 , wherein the pressure is at least 4000 psi.

13. The method of claim 8 , wherein the pressure is at least 2000 psi.

14. The method of claim 8 , wherein the pressure is between 2000 psi and 10000 psi.

15. The method of claim 8 , wherein electrically connecting a metallic coating on an exterior surface of an insulating structure to an electrical potential comprises electrically connecting the metallic coating to ground.

16. The method of claim 8 , wherein electrically connecting a metallic coating on an exterior surface of an insulating structure to an electrical potential comprises electrically connecting the metallic coating to a conductive fitting held at a direct-current (DC) electric potential, the DC electric potential being a different potential than a potential of the metallic coating such that a potential difference is formed between the metallic coating and the conductive fitting.

17. The method of claim 8 , wherein the plurality of target material droplets includes fewer than all of the target material droplets in the stream.

Assignees

• Asml Netherlands Bv

Inventors

• De Dea Silvia
• Vaschenko Georgiy O
• Baumgart Peter
• Bowering Norbert

Classifications

• H05G2/002

  Supply of the plasma generating material · CPC title

• C23C14/185 Primary

  by cathodic sputtering · CPC title

• H05G2/003

  the plasma being generated from a material in a liquid or gas state · CPC title

• H05G2/006

  Electricity · mapped topic

• G03F7/70033 Primary

  by plasma extreme ultraviolet [EUV] sources · CPC title