Device for producing a mono-crystalline sheet of semiconductor material from a molten alloy held between at least two aperture elements

US10066312B2 · US · B2

Patent metadata
FieldValue
Publication numberUS-10066312-B2
Application numberUS-201615262138-A
CountryUS
Kind codeB2
Filing dateSep 12, 2016
Priority dateMay 31, 2010
Publication dateSep 4, 2018
Grant dateSep 4, 2018

How to read this patent

A practical reading order for non-experts. Skip the full description unless you need deep technical detail.

  1. Title

    What the patent document calls the invention.

  2. Abstract

    A short plain-language summary of the technical disclosure.

  3. Assignees and inventors

    Who owns or filed the patent and who is credited as inventor.

  4. Key dates

    Filing, priority, publication, and grant dates set the timeline.

  5. First independent claim

    The legal scope of protection — read this for what is actually claimed.

  6. CPC / IPC classifications

    Technology tags used to group this patent with similar filings.

  7. Citations and related patents

    Prior art links and similar publications in this corpus.

Abstract

Official abstract text for this publication.

A method for producing a mono-crystalline sheet includes providing at least two aperture elements forming a gap in between; providing a molten alloy including silicon in the gap; providing a gaseous precursor medium comprising silicon in the vicinity of the molten alloy; providing a silicon nucleation crystal in the vicinity of the molten alloy; and bringing in contact said silicon nucleation crystal and the molten alloy. A device for producing a mono-crystalline sheet includes at least two aperture elements at a predetermined distance from each other, thereby forming a gap, and being adapted to be heated for holding a molten alloy including silicon by surface tension in the gap between the aperture elements; a precursor gas supply supplies a gaseous precursor medium comprising silicon in the vicinity of the molten alloy; and a positioning device for holding and moving a nucleation crystal in the vicinity of the molten alloy.

First claim

Opening claim text (preview).

What we claim is: 1. A device for producing a mono-crystalline semiconductor sheet comprising: at least two horizontal aperture elements with a length greater than a thickness and the length oriented in a plane parallel to earth, and disposed by a distance from each other thereby forming a gap, and the at least two horizontal aperture elements being adapted to be heated, and the at least two horizontal aperture elements adapted to hold, below the gap by surface tension in the gap, a molten alloy comprising a mixture of two or more elements one of which is a metal; a precursor gas supply for delivering a gaseous precursor medium comprising silicon in the vicinity of the molten alloy; and a positioning device for holding and moving a nucleation crystal below of the molten alloy that is continuously growing below the molten alloy. 2. The device of claim 1 , wherein the two horizontal aperture elements have end sections opposite each other forming boundaries of the gap whose cross-sectional shape is a truncated v-shaped. 3. The device of claim 2 , wherein the two horizontal aperture elements have a coating comprising one of metal oxides and a carbon coating. 4. The device of claim 3 , wherein the distance is less than 200 micrometers. 5. The device of claim 4 , wherein the device is adapted to: produce a mono-crystalline sheet of a semiconductor material comprising provide at least two horizontal aperture elements forming a gap in between; provide a molten alloy comprising the semiconductor material in the gap between the at least two horizontal aperture elements, whereby the molten alloy is held between the at least two horizontal aperture elements by surface tension; provide a gaseous precursor medium delivering the semiconductor material in the vicinity of the molten alloy; provide a nucleation crystal in the vicinity of the molten alloy; and bring in contact said nucleation crystal and the molten alloy.

Assignees

Inventors

Classifications

  • C30B11/10Primary

    Solid or liquid components, e.g. Verneuil method · CPC title

  • by pulling from a melt · CPC title

  • Vaporous components, e.g. vapour-liquid-solid-growth · CPC title

  • Monocrystalline silicon PV cells · CPC title

  • Flat crystals, e.g. plates, strips or discs · CPC title

Patent family

Related publications grouped by family.

External sources

Frequently asked questions

Answers are generated from the same data shown on this page.

What does patent US10066312B2 cover?
A method for producing a mono-crystalline sheet includes providing at least two aperture elements forming a gap in between; providing a molten alloy including silicon in the gap; providing a gaseous precursor medium comprising silicon in the vicinity of the molten alloy; providing a silicon nucleation crystal in the vicinity of the molten alloy; and bringing in contact said silicon nucleation c…
Who is the assignee on this patent?
IBM
What technology area does this patent fall under?
Primary CPC classification C30B11/10. Mapped technology areas include Chemistry & Metallurgy.
When was this patent published?
Publication date Tue Sep 04 2018 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).