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Exposure apparatus, exposure method, and method for producing device
US9182684B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9182684-B2 |
| Application number | US-201414268558-A |
| Country | US |
| Kind code | B2 |
| Filing date | May 2, 2014 |
| Priority date | Feb 26, 2003 |
| Publication date | Nov 10, 2015 |
| Grant date | Nov 10, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outlet, the recovery outlet surrounding a path of the exposure light and the liquid confinement member confining the liquid to an area that is smaller than an area of the substrate upper surface by removing the liquid from a gap between the confinement member and the substrate upper surface. A first support member supports the projection system, and a second support member supports the liquid confinement member. An anti-vibration system limits vibrations from being transmitted from the second support member to the projection system.
First claim
Opening claim text (preview).
What is claimed is: 1. An exposure apparatus comprising: a projection system having a final element, the projection system projecting exposure light to an upper surface of a substrate through liquid between the final element and the upper surface of the substrate; an alignment system which detects a mark of the substrate; a liquid confinement member having a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the upper s…
Assignees
Inventors
Classifications
- G03F7/70341Primary
Physics · mapped topic
- G03F7/708Primary
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
Physics · mapped topic
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Frequently asked questions
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- What does patent US9182684B2 cover?
- An exposure apparatus having a projection system with a final element projects exposure light to an upper surface of a substrate through liquid between the final element and the substrate upper surface. A liquid confinement member has a recovery outlet via which the liquid is removed along with gas, the recovery outlet being arranged such that the substrate upper surface faces the recovery outl…
- Who is the assignee on this patent?
- Nikon Corp
- What technology area does this patent fall under?
- Primary CPC classification G03F7/70341. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Nov 10 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).