Lithographic apparatus and device manufacturing method

Patent metadata

Field	Value
Publication number	US-9235140-B2
Application number	US-201113579539-A
Country	US
Kind code	B2
Filing date	Feb 18, 2011
Priority date	Feb 23, 2010
Publication date	Jan 12, 2016
Grant date	Jan 12, 2016

Abstract

A lithographic apparatus having an optical column capable of projecting a beam on a target portion on a substrate held by the substrate support. The optical column may have a self-emissive contrast device to emit the beam. The optical column may include a projection system to project the beam onto the target portion. The target portion has a height in a scanning direction of the substrate and a tangential width mainly perpendicular to the scanning direction, wherein a scanning speed of the substrate in the scanning direction divided by the height substantially corresponds with a rotating speed of the optical column or a part thereof divided by the tangential width of the target portion.

First claim

What is claimed is:

1. An apparatus comprising:
an optical column capable of projecting a beam on a target portion of a substrate, the optical column comprising a projection system configured to project the beam onto the target portion;
a scanning movement actuator to move the substrate with a scanning speed in a scanning direction with respect to the optical column; and
a rotating movement actuator to rotate the optical column or a part thereof with a rotating frequency resulting in a tangential rotation speed of the beam on the target portion,
wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of the beam divided by the tangential width.

2. The apparatus of claim 1 , wherein the rotating frequency of the rotatable column or part thereof is selected from the range of 2500 to 10000 rpm.

3. The apparatus of claim 1 , wherein the optical column comprises a self-emissive contrast device configured to emit the beam.

4. The apparatus of claim 3 , wherein the self-emissive contrast device is mounted on a stationary part of the optical column.

5. The apparatus of claim 3 , wherein the optical column comprises multiple self-emissive contrast devices arranged with a radial pitch.

6. The apparatus of claim 5 , wherein the number of self-emissive contrast devices per optical column is selected from the range of 2 to 40.

7. The apparatus of claim 5 , wherein the radial pitch, at the projection image plane on the substrate, is selected from the range of 50% to 95% of a projection resolution of the apparatus.

8. The apparatus of claim 7 , wherein the projection resolution is smaller than or equal to 10 μm.

9. The apparatus of claim 1 , wherein the radius of a central axis of the optical column comprising lenses is selected from the range of 50 to 500 mm.

10. The apparatus of claim 1 , wherein the tangential rotation speed of the beam on the target portion is selected from the range of 25 to 400 m/s.

11. The apparatus of claim 1 , wherein the tangential width of the target portion is selected from the range of 5 to 40 mm.

12. The apparatus of claim 1 , comprising multiple optical columns, each optical column having one or more self-emissive contrast devices configured to project a beam on a respective target portion, the respective target portions of the multiple optical columns being spaced in a direction perpendicular to the scanning direction.

13. The apparatus of claim 12 , wherein the respective target portions cover the dimension of the substrate in the direction perpendicular to the scanning direction.

14. The apparatus of claim 1 , comprising multiple rotatable optical columns or parts thereof.

15. A device manufacturing method comprising:
projecting a beam on a target portion of a substrate using an optical column, the optical column comprising a projection system configured to project the beam onto the target portion;
moving the substrate with a scanning speed in a scanning direction with respect to the optical column; and
rotating the optical column or a part thereof with a rotating frequency resulting in a tangential rotation speed of the beam on the target portion,
wherein the target portion has a height in the scanning direction and a tangential width mainly perpendicular to the scanning direction, wherein the scanning speed divided by the height substantially corresponds with the tangential rotation speed of the beam divided by the tangential width.

16. The method of claim 15 , wherein the radius of a central axis of the optical column comprising lenses is selected from the range of 50 to 500 mm.

17. The method of claim 15 , wherein the tangential rotation speed of the beam on the target portion is selected from the range of 25 to 400 m/s.

18. The method of claim 15 , wherein the tangential width of the target portion is selected from the range of 5 to 40 mm.

19. The method of claim 15 , wherein the optical column comprises multiple self-emissive contrast devices arranged with a radial pitch, the radial pitch, at the projection image plane on the substrate, is selected from the range of 50% to 95% of a projection resolution of the apparatus.

20. The method of claim 15 , comprising projecting a beam onto a plurality of target portions, wherein the target portions in the scanning direction and/or in the direction perpendicular to the scanning direction partially overlap.

Assignees

• Van Zwet Erwin John
• De Jager Pieter Willem Herman
• Onvlee Johannes
• Fritz Erik Christiaan
• Asml Netherlands Bv

Inventors

• Van Zwet Erwin John
• De Jager Pieter Willem Herman
• Onvlee Johannes
• Fritz Erik Christiaan

Classifications

• G03F7/70275

  Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems · CPC title

• G03F7/2051

  Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source (G03F7/70 takes precedence) · CPC title

• G03F7/70391

  Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays · CPC title

• G03F7/704 Primary

  Scanned exposure beam, e.g. raster-, rotary- and vector scanning (mask projection exposure involving relative movement of patterned beam and workpiece during imaging G03F7/70358) · CPC title

• H10P76/2041 Primary

  Photolithographic processes · CPC title