Optical system and substrate sealing method

Patent metadata

Field	Value
Publication number	US-9201245-B2
Application number	US-201313858200-A
Country	US
Kind code	B2
Filing date	Apr 8, 2013
Priority date	Dec 21, 2012
Publication date	Dec 1, 2015
Grant date	Dec 1, 2015

Abstract

An optical system includes an enlarging optical system that enlarges a section of an incident light, a mask that passes some of a light passing through the enlarging optical system, and a reduction optical system that reduces a section of a light passing through the mask.

First claim

What is claimed is:

1. A method of sealing a first and a second substrate by irradiating light to a sealing portion arranged between the first and second substrates, the method comprising:
disposing the sealing portion between the first and second substrates;
enlarging a section of an incident light;
passing light with an enlarged section through a mask;
reducing a section of light that has passed through the mask with a reduction optical system; and
irradiating light that has passed through the reduction optical system along a sealing line of the sealing portion.

2. The method of claim 1 , wherein the intensity of light on a surface of the mask is in a range of about 0.1 W/mm 2 to about 1 W/mm 2 .

3. The method of claim 1 , wherein light that has passed through the reduction optical system is irradiated to the sealing portion in the form of a spot beam.

4. The method of claim 1 , wherein the enlarging of the section of the incident light includes:
changing the incident light to a parallel light;
reflecting the parallel light; and
making the reflected parallel light form an image on the mask.

5. The method of claim 1 , further comprising rotating the mask.

6. The method of claim 1 , wherein the reducing of the section of light that has passed through the mask includes:
changing the light passing through the mask to a parallel light;
reflecting the parallel light;
making the reflected parallel light form a focal point through a lens; and
reducing a section of light passing through the lens.

7. The method of claim 6 , further comprising moving the lens in a direction parallel to the traveling direction of the light passing through the lens.

8. The method of claim 1 , wherein after focusing a central line of a light passing through the reduction optical system, on a central line of the sealing line, scanning is performed along the central line of the sealing portion to irradiate a light passing through the reduction optical system.

9. The method of claim 1 , wherein a width LW of a light passing through the reduction optical system is greater than a width of the sealing portion.

10. The method of claim 3 , wherein the sealing portion comprises a frit.

Assignees

• Lee Jung-Min
• Kim Young-Kwan
• Samsung Display Co Ltd
• Lis Co Ltd

Inventors

• Lee Jung-Min
• Kim Young-Kwan

Classifications

• H10W90/762

  between stacked chips · CPC title

• H10P95/00

  Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass · CPC title

• G06F3/041

  Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means · CPC title

• H05B33/04

  Sealing arrangements {, e.g. against humidity} · CPC title

• G02B27/0988 Primary

  Diaphragms, spatial filters, masks for removing or filtering a part of the beam · CPC title