Chemically amplified positive resist composition and resist pattern forming process
US-12164231-B2 · Dec 10, 2024 · US
Mask plate
US9529252B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-9529252-B2 |
| Application number | US-201214395711-A |
| Country | US |
| Kind code | B2 |
| Filing date | Dec 4, 2012 |
| Priority date | Jun 29, 2012 |
| Publication date | Dec 27, 2016 |
| Grant date | Dec 27, 2016 |
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Abstract
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A mask plate is used for implementing a graphic structure with a narrower line width on a target substrate. The mask plate includes a slit-shaped photic area and a lightproof area. An edge of the slit-shaped photic area is in a curve shape.
First claim
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The invention claimed is: 1. A mask plate, comprising a slit-like light-transparent region and lightproof regions, and bumps that are disposed outside ends of each of edges of the slit-like light-transparent region respectively, wherein an edge of the slit-like light-transparent region is in a curve shape. 2. The mask plate as claimed in claim 1 , wherein the curve shape is a zigzag shape or a wave-like shape. 3. The mask plate as claimed in…
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Frequently asked questions
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- What does patent US9529252B2 cover?
- A mask plate is used for implementing a graphic structure with a narrower line width on a target substrate. The mask plate includes a slit-shaped photic area and a lightproof area. An edge of the slit-shaped photic area is in a curve shape.
- Who is the assignee on this patent?
- Boe Technology Group Co Ltd, Beijing Boe Optoelectronics Tech Co Ltd
- What technology area does this patent fall under?
- Primary CPC classification G03F1/50. Mapped technology areas include Physics.
- When was this patent published?
- Publication date Tue Dec 27 2016 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).