Customized pupil stop shape for control of edge profile in laser annealing systems

Patent metadata

Field	Value
Publication number	US-2016327801-A1
Application number	US-201615212964-A
Country	US
Kind code	A1
Filing date	Jul 18, 2016
Priority date	Mar 12, 2013
Publication date	Nov 10, 2016
Grant date	—

Abstract

Embodiments of the invention generally relate to laser annealing systems with optics for imaging a pattern on a substrate. The optics may comprise an aperture or plurality of apertures which shape an image to be exposed on a surface of a substrate. The image may be determined by the shape of an aperture within the optics system.

First claim

1 . An apparatus for use in an optical system, comprising:
a light source for providing illumination having a first numerical aperture; a first aperture member having a first aperture; a second aperture member having a second aperture; and a relay optic aligned along an optical axis of the illumination having a second numerical aperture defined by the second aperture, wherein the second aperture has a dimension in a first direction different from a dimension in a second direction, the dimension in the first direction being adapted to match a ratio of the first numerical aperture at the first aperture to the second numerical aperture of the relay optic.

2 . The apparatus of claim 1 , wherein the first aperture member is illuminated by the light source and the first aperture member is adapted to form an image from the illumination.

3 . The apparatus of claim 2 , wherein the image formed by the first aperture is substantially rectangular.

4 . The apparatus of claim 1 , wherein the second aperture member is disposed downstream from the first aperture member.

5 . The apparatus of claim 1 , wherein the light source comprises a plurality of laser beams.

6 . The apparatus of claim 5 , wherein the plurality of laser beams comprise a bi-polar laser source.

7 . The apparatus of claim 1 , wherein the second aperture member is a relay aperture.

8 . The apparatus of claim 1 , wherein the second aperture member comprises a body defining an opening.

9 . The apparatus of claim 8 , wherein the opening is an oblong opening.

10 . The apparatus of claim 9 , wherein the oblong opening has a plurality of linear edges and a plurality of curved edges.

11 . An apparatus for use in an optical system, comprising:
a light source for providing illumination having a first numerical aperture; a first aperture member having a first aperture; a second aperture member having a second aperture; and a relay optic aligned along an optical axis of the illumination having a second numerical aperture defined by the second aperture, wherein the second aperture has a dimension in a second direction perpendicular to a dimension in a first direction, the dimension in the first direction being adapted to match a ratio of the first numerical aperture at the first aperture to the second numerical aperture of the relay optic.

12 . The apparatus of claim 11 , wherein the first aperture member is illuminated by the light source and the first aperture member is adapted to form an image from the illumination.

13 . The apparatus of claim 12 , wherein the image formed by the first aperture is substantially rectangular.

14 . The apparatus of claim 11 , wherein the second aperture member is disposed downstream from the first aperture member.

15 . The apparatus of claim 11 , wherein the light source comprises a plurality of laser beams.

16 . The apparatus of claim 15 , wherein the plurality of laser beams comprise a bi-polar laser source.

17 . The apparatus of claim 11 , wherein the second aperture member is a relay aperture.

18 . The apparatus of claim 11 , wherein the second aperture member comprises a body defining an opening.

19 . The apparatus of claim 18 , wherein the opening is an oblong opening.

20 . The apparatus of claim 19 , wherein the oblong opening has a plurality of linear edges and a plurality of curved edges.

Assignees

• Applied Materials Inc

Inventors

• Holmgren Douglas E

Classifications

• H10P95/90

  Thermal treatments, e.g. annealing or sintering · CPC title

• H10P34/422

  using incoherent radiation · CPC title

• H10P34/42 Primary

  with electromagnetic radiation, e.g. laser annealing (laser cutting H10P54/20) · CPC title

• G02B27/0911

  Anamorphotic systems · CPC title

• C21D1/09

  by direct application of electrical or wave energy; by particle radiation · CPC title