Rapid Thermal Processing System With Cooling System
US-2024379390-A1 · Nov 14, 2024 · US
Heating device, coating and developing system, heating method and storage medium
US8933376B2 · US · B2
| Field | Value |
|---|---|
| Publication number | US-8933376-B2 |
| Application number | US-1519108-A |
| Country | US |
| Kind code | B2 |
| Filing date | Jan 16, 2008 |
| Priority date | Jan 17, 2007 |
| Publication date | Jan 13, 2015 |
| Grant date | Jan 13, 2015 |
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- Title
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Abstract
Official abstract text for this publication.
A heating device has a heating chamber 3 . An initial temperature distribution is created in a surface of a substrate (wafer W) when the substrate is carried into the heating chamber 3 . . . Temperature distribution creating means (heating lamps 2 ) creates a preheating temperature distribution in the substrate supported on a cooling plate 4 at a waiting position before the substrate is carried into the heating chamber 3 so as to level out the initial temperature distribution.
First claim
Opening claim text (preview).
What is claimed is: 1. A heating device comprising: a heating chamber contained in a processing vessel for heating and processing, and provided with heating plates for heating a substrate; a carrier device which transversely carries a substrate placed at a waiting position positioned at a neighboring side of the heating chamber and outside the heating chamber into the heating chamber in the processing vessel, the carrier device carrying the substrate in a direction from a front…
Assignees
Inventors
Classifications
- H10P72/0602Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
Physics · mapped topic
- F27B17/0025Primary
Mechanical Engineering · mapped topic
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Frequently asked questions
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- What does patent US8933376B2 cover?
- A heating device has a heating chamber 3 . An initial temperature distribution is created in a surface of a substrate (wafer W) when the substrate is carried into the heating chamber 3 . . . Temperature distribution creating means (heating lamps 2 ) creates a preheating temperature distribution in the substrate supported on a cooling plate 4 at a waiting position before the substrate is c…
- Who is the assignee on this patent?
- Fukuoka Tetsuo, Kitano Takahiro, Terada Kazuo, and 1 more
- What technology area does this patent fall under?
- Primary CPC classification H10P72/0602. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Tue Jan 13 2015 00:00:00 GMT+0000 (Coordinated Universal Time) (B2). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).