Substrate processing apparatus and substrate processing method
US-10474139-B2 · Nov 12, 2019 · US
Diagnostic device, semiconductor manufacturing equipment system, semiconductor equipment manufacturing system, and diagnostic method
US2024321608A1 · US · A1
| Field | Value |
|---|---|
| Publication number | US-2024321608-A1 |
| Application number | US-202218026217-A |
| Country | US |
| Kind code | A1 |
| Filing date | Mar 14, 2022 |
| Priority date | Mar 14, 2022 |
| Publication date | Sep 26, 2024 |
| Grant date | — |
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Abstract
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An object of the present disclosure is to provide a technique for detecting an anomaly of the surface state of the film of an electrostatic chuck. In a diagnostic device for diagnosing the state of a semiconductor manufacturing device having a sample stage on which a sample electrostatically adsorbed to a film is mounted, temperature data before and after a change of energy applied to the sample is obtained, and an anomaly of the film is detected on the basis of the obtained temperature data.
First claim
Opening claim text (preview).
1 . A diagnostic device for diagnosing the state of a semiconductor manufacturing device having a sample stage on which a sample electrostatically adsorbed to a film is mounted, wherein temperature data before and after a change of energy applied to the sample is obtained, and an anomaly of the film is detected on the basis of the obtained temperature data. 2 . The diagnostic device according to claim 1 , wherein a difference between the average value of a temperatur…
Assignees
Inventors
Classifications
- H10P72/722Primary
Electricity · mapped topic
Electricity · mapped topic
- H10P72/0602Primary
Electricity · mapped topic
Electricity · mapped topic
Electricity · mapped topic
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Frequently asked questions
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- What does patent US2024321608A1 cover?
- An object of the present disclosure is to provide a technique for detecting an anomaly of the surface state of the film of an electrostatic chuck. In a diagnostic device for diagnosing the state of a semiconductor manufacturing device having a sample stage on which a sample electrostatically adsorbed to a film is mounted, temperature data before and after a change of energy applied to the sampl…
- Who is the assignee on this patent?
- Hitachi High Tech Corp
- What technology area does this patent fall under?
- Primary CPC classification H10P72/722. Mapped technology areas include Electricity.
- When was this patent published?
- Publication date Thu Sep 26 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
- What related patents are in patentsdb?
- We list 2 related publications on this page (citations in our corpus or others sharing the same primary CPC).