Apparatus for processing a plurality of substrates provided with an extractor chamber

Patent metadata

Field	Value
Publication number	US-2025389485-A1
Application number	US-202519247162-A
Country	US
Kind code	A1
Filing date	Jun 24, 2025
Priority date	Jul 6, 2021
Publication date	Dec 25, 2025
Grant date	—

Abstract

An apparatus 1 for processing a plurality of substrates 3 is provided. The apparatus may have a process tube 5 creating a process chamber 7; a heater 9 surrounding the process tube 5; a flange 11 for supporting the process tube; and a door 15 configured to support a wafer boat 17 with a plurality of substrates 3 in the process chamber and to seal the process chamber 7. An exhaust operably connected to the process chamber 7 may be provided to remove gas from the process chamber via a first exhaust duct 19. The apparatus may be provided with an extractor chamber 21 surrounding the first exhaust duct where it connects to the process chamber and connected to a second exhaust duct 23 to remove gas from the extractor chamber.

First claim

1 . A system for processing a plurality of substrates, comprising;
a process chamber configured to support the plurality of substrates; a heater surrounding the process chamber; a first exhaust duct in fluid connection with the process chamber and configured to remove gas from the process chamber; and an extractor chamber in fluid connection with a space between the process chamber and the heater and comprising:
at least a portion of the first exhaust duct; and
a second exhaust duct configured to remove gas from the space, wherein a first gas flow in the first exhaust duct is different from a second gas flow in the second exhaust duct.

2 . The system of claim 1 , further comprising a flange for supporting the process chamber and comprising a flange opening giving access to an opening of the process chamber.

3 . The system of claim 1 , further comprising a door configured to support, in the process chamber, a wafer boat configured to support the plurality of substrates and to seal the process chamber.

4 . The system of claim 1 , further comprising a process gas production unit operably in fluid communication with the process chamber and configured to provide process gas into the process chamber.

5 . The system of claim 4 , wherein the extractor chamber comprises the process gas production unit.

6 . The system of claim 4 , further comprising a gas injection tube coupling the process gas production unit with the process chamber.

7 . The system of claim 6 , wherein the extractor chamber comprises at least a portion of the gas injection tube.

8 . The system of claim 4 , wherein the process gas production unit is provided with a first production gas line and a second production gas line.

9 . The system of claim 8 , wherein the first production gas line is arranged to provide hydrogen.

10 . The system of claim 8 , wherein the second production gas line is arranged to provide oxygen.

11 . The system of to claim 4 , wherein the process gas comprises hydrogen and oxygen.

12 . The system of claim 1 , wherein the second exhaust duct is not connected to the first exhaust duct.

13 . The system of claim 1 , wherein the extractor chamber is provided with openings to create a flow in the extractor chamber and the second exhaust duct.

14 . The system of to claim 13 , wherein the openings are provided at a connection of:
the first exhaust duct with the process chamber; and the extractor chamber with the second exhaust duct.

15 . The system of claim 1 , wherein the system is provided with a plurality of sidewalls to limit access to the system.

16 . The system of claim 15 , wherein the system is provided with a door in one of the plurality of sidewalls, and wherein the door provides access for maintenance.

17 . The system of claim 1 , wherein the extractor chamber is provided with an extractor door for giving access to the first exhaust duct or any other device in the extractor chamber.

18 . The system of claim 1 , wherein the extractor chamber further comprises a valve.

19 . The system of claim 18 , wherein a part of the valve is provided in a gas injection tube, the first exhaust duct, the second exhaust duct, or a production gas line.

20 . The system of claim 1 , wherein the removed gas comprises gas leaked from the heater, the process chamber, the first exhaust duct, or a gas injection tube.

Assignees

• Asm Ip Holding Bv

Inventors

• Oosterlaken Theodorus G M
• Garssen Adriaan
• Terhorst Herbert
• Jdira Lucian

Classifications

• H10P72/0434

  mainly by convection · CPC title

• H10P72/0402 Primary

  Apparatus for fluid treatment (H10P72/0441, H10P72/0448 take precedence) · CPC title

• H10P72/7604

  the wafers being placed on a susceptor, stage or support · CPC title

• H10P72/0431

  Apparatus for thermal treatment · CPC title

• H10P72/0432 Primary

  mainly by conduction · CPC title