Film-forming device

US2025210320A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2025210320-A1
Application numberUS-202218849892-A
CountryUS
Kind codeA1
Filing dateApr 4, 2022
Priority dateApr 4, 2022
Publication dateJun 26, 2025
Grant date

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  1. Title

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  2. Abstract

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  3. Assignees and inventors

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  4. Key dates

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  5. First independent claim

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Abstract

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A film-forming device forms a film by vapor deposition on an object's surface to be treated by vaporizing a cathode material constituting a cathode by a plasma generator which generates plasma by an arc discharge. The plasma generator includes a cathode part, an anode part arranged at an appropriate distance from the cathode part, a magnetic field generator and a protection member. The magnet field generator is constituted by the anode part or constituted integrally with or continuously from the anode part and generates a magnetic field by an electric current of the arc discharge. The protection member is constituted by part of the anode part, or constituted independently from the anode part while electrically connected to the anode part, and arranged outside a plasma flow region and protects part or a whole of the magnetic field generator from attachment of the cathode material.

First claim

Opening claim text (preview).

1 . A film-forming device, comprising plasma generating means for generating plasma by an arc discharge in vacuum between a cathode and an anode electrically connected to each other by way of a power source, and vaporizing a cathode material constituting the cathode and forming a film by vapor deposition on a surface of an object to be treated, the plasma generating means comprising: a cathode part; an anode part arranged at an appropriate distance from the cathode part; a magnetic field generator constituted by the anode part or constituted integrally with or continuously from the anode part and generating a magnetic field by a self current of the arc discharge; and a protection member constituted by part of the anode part, or constituted independently from the anode part while electrically connected to the anode part, or substituted by part of the magnetic field generator, and arranged between the magnetic field generator and the plasma to protect part or a whole of the magnetic field generator from the cathode material. 2 . The film-forming device according to claim 1 , wherein the magnetic field generator is arranged in a roughly tubular shape surrounding a plasma flow region, and the protection member is a water-cooling ring member arranged at at least one of ends on a cathode side or its opposite side of the roughly tubular magnetic field generator, and having a surface with an appropriate area in a radial direction of the magnetic field generator and having a hollow inner part for introducing cooling water. 3 . The film-forming device according to claim 1 , wherein the magnetic field generator is formed in a roughly tubular shape surrounding a plasma flow region, and the protection member is a tubular member arranged between the plasma flow region and the magnetic field generator. 4 . The film-forming device according to claim 3 , wherein the protection member has a plurality of through holes. 5 . The film-forming device according to claim 3 , wherein at least an inner surface of the protection member is uneven. 6 . The film-forming device according to claim 5 , wherein the inner surface of the protection member has a shape selected from the group consisting of a large number of standing parts formed by making a plurality of partial cuts in the protection member and bending parts of the protection member to stand, a large number of through holes formed by perforating appropriate parts of the protection member, a plurality of dents formed by denting the inner surface for an appropriate interval, a large number of projections formed by projecting the inner surface for an appropriate interval, and a plurality of annular projections continuously projecting in a circumferential direction of the roughly tubular shape. 7 . The film-forming device according to claim 1 , wherein the magnetic field generator is a coiled magnetic field generator constituted by a continuously and spirally 8 winding conductive material or a continuously and spirally winding hollow conductive material. 8 . The film-forming device according to claim 1 , wherein the magnetic field generator comprises a plurality of electrically conductive plate members arranged at appropriate intervals, and each of the plate members has a roughly horse-shoe shape in which part of a ring has a notch, and an end on one side of a notch of any one of the plate members is electrically connected with an end on the other side of a notch of an adjacent one to the one of the plate member so that an electric current of an arc discharge flows sequentially between each adjacent two of the plate members in a manner to flow in a roughly spiral shape. 9 . The film-forming device according to claim 8 , wherein the plate members are arranged so that center positions of the roughly horse-shoe shapes are sequentially displaced in angular direction with respect to a plasma flow direction, thereby making the central holes of the magnetic field generator meander. 10 . The film-forming device according to claim 9 , wherein the magnetic field generator has a water-cooling ring member in a hollow annular shape at a given position from a starting end side to a finishing end side of the plate members. 11 . The film-forming device according to claim 1 , wherein the magnetic field generator generates a magnetic field having a magnetic flux density within the range of 0.01 to 20 mT.

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What does patent US2025210320A1 cover?
A film-forming device forms a film by vapor deposition on an object's surface to be treated by vaporizing a cathode material constituting a cathode by a plasma generator which generates plasma by an arc discharge. The plasma generator includes a cathode part, an anode part arranged at an appropriate distance from the cathode part, a magnetic field generator and a protection member. The magnet f…
Who is the assignee on this patent?
National Univ Corporation Toyohashi Univ Of Technology, Osg Corp
What technology area does this patent fall under?
Primary CPC classification H01J37/32669. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Jun 26 2025 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 8 related publications on this page (citations in our corpus or others sharing the same primary CPC).