Gain cell using planar and trench ferroelectric and anti-ferroelectric capacitors for edram

US2024114697A1 · US · A1

Patent metadata
FieldValue
Publication numberUS-2024114697-A1
Application numberUS-202217958279-A
CountryUS
Kind codeA1
Filing dateSep 30, 2022
Priority dateSep 30, 2022
Publication dateApr 4, 2024
Grant date

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  1. Title

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  2. Abstract

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  5. First independent claim

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Abstract

Official abstract text for this publication.

Embodiments disclosed herein include a memory device. In an embodiment, the memory device comprises a first transistor, where the first transistor is an access transistor to write data. In an embodiment, the memory device further comprises a ferroelectric capacitor for storing data. In an embodiment, the memory device further comprises a second transistor, where the second transistor is a sense transistor to read the data stored on the ferroelectric capacitor.

First claim

Opening claim text (preview).

What is claimed is: 1 . A memory device, comprising: a first transistor, wherein the first transistor is an access transistor to write data; a ferroelectric capacitor for storing data; and a second transistor, wherein the second transistor is a sense transistor to read the data stored on the ferroelectric capacitor. 2 . The memory device of claim 1 , wherein the first transistor, the second transistor, and the ferroelectric capacitor are coupled together by a node. 3 . The memory device of claim 2 , wherein the node is coupled to a terminal of the ferroelectric capacitor, a drain of the first transistor and a gate of the second transistor. 4 . The memory device of claim 1 , wherein the ferroelectric capacitor comprises hafnium, zirconium, and oxygen, or perovskite materials, or aluminum, scandium, and nitrogen. 5 . The memory device of claim 1 , wherein the ferroelectric capacitor is a planar capacitor. 6 . The memory device of claim 1 , wherein the ferroelectric capacitor is a trench capacitor. 7 . The memory device of claim 1 , wherein the ferroelectric capacitor is coupled to a plate line. 8 . The memory device of claim 1 , wherein a gate of the first transistor is coupled to a write word line, and wherein a drain of the first transistor is coupled to a write bit line. 9 . The memory device of claim 1 , wherein a source of the second transistor is coupled to a read word line, and wherein a drain of the second transistor is coupled to a read bit line. 10 . The memory device of claim 1 , wherein the ferroelectric capacitor is stacked above the first transistor and the second transistor. 11 . The memory device of claim 10 , wherein the ferroelectric capacitor is directly over the first transistor. 12 . The memory device of claim 1 , wherein the first transistor is laterally adjacent to the second transistor. 13 . The memory device of claim 1 , wherein the first transistor and the second transistor are planar, fin-based transistors, nanowire-based transistors, nanoribbon-based transistors, or nanosheet-based transistors. 14 . A memory device comprising: a semiconductor fin; a first transistor formed on the semiconductor fin; a second transistor formed on the semiconductor fin adjacent to the first transistor; a ferroelectric capacitor over the first transistor; and a node to electrically couple the first transistor, the second transistor, and the ferroelectric capacitor together. 15 . The memory device of claim 14 , wherein the node is coupled to a terminal of the ferroelectric capacitor, a drain of the first transistor, and a gate of the second transistor. 16 . The memory device of claim 14 , wherein the first transistor is a write transistor, and wherein the second transistor is a read transistor. 17 . The memory device of claim 14 , wherein the ferroelectric capacitor comprises hafnium, zirconium, and oxygen, or perovskite materials, or aluminum, scandium, and nitrogen. 18 . A computing system, comprising: a board; a device coupled to the board, wherein the device comprises a memory structure, wherein the memory structure, comprises: an access transistor; a sense transistor adjacent to the access transistor; and a ferroelectric capacitor, wherein the ferroelectric capacitor is over the access transistor and the sense transistor. 19 . The computing system of claim 18 , further comprising: a processor coupled to the board. 20 . The computing system of claim 18 , further comprising: a communication chip coupled to the board.

Assignees

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Classifications

  • Electricity · mapped topic

  • H10B53/30Primary

    characterised by the memory core region · CPC title

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What does patent US2024114697A1 cover?
Embodiments disclosed herein include a memory device. In an embodiment, the memory device comprises a first transistor, where the first transistor is an access transistor to write data. In an embodiment, the memory device further comprises a ferroelectric capacitor for storing data. In an embodiment, the memory device further comprises a second transistor, where the second transistor is a sense…
Who is the assignee on this patent?
Intel Corp
What technology area does this patent fall under?
Primary CPC classification H01L27/11507. Mapped technology areas include Electricity.
When was this patent published?
Publication date Thu Apr 04 2024 00:00:00 GMT+0000 (Coordinated Universal Time) (A1). Legal status and post-grant events are not shown on this page.
What related patents are in patentsdb?
We list 6 related publications on this page (citations in our corpus or others sharing the same primary CPC).